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Prolonged menstrual cycles in female workers exposed to ethylene glycol ethers in the semiconductor manufacturing industry. Commentary

Author
CORDIER, S (Commentator (written text)) 1 ; MULTIGNER, L (Commentator (written text)) 1 ; HSIEH, G.-Y2 ; WANG, J.-D2 ; CHENG, T.-J2 ; CHEN, P.-C2
[1] Inserm U625, University of Rennes, Rennes, France
[2] Institute of Occupational Medicine and Industrial Hygiene, National Taiwan University College of Public Health, Taipei, Taiwan, Province of China
Source

Occupational and environmental medicine (London). 2005, Vol 62, Num 8, pp 507-508, 9 p ; ref : 48 ref

ISSN
1351-0711
Scientific domain
Environment; Hygiene and public health, epidemiology, occupational medicine; Toxicology
Publisher
BMJ, London
Publication country
United Kingdom
Document type
Article
Language
English
Keyword (fr)
Cycle menstruel pathologie Cycle menstruel Exposition professionnelle Fabrication Femelle Homme Industrie Semiconducteur Toxicité Travailleur Ether glycol Taiwan Appareil génital femelle pathologie Médecine du travail Solvant organique Asie
Keyword (en)
Menstruation disorders Menstrual cycle Occupational exposure Manufacturing Female Human Industry Semiconductor materials Toxicity Worker Taiwan Female genital diseases Occupational medicine Organic solvent Asia
Keyword (es)
Ciclo menstrual patología Ciclo menstrual Exposición profesional Fabricación Hembra Hombre Industria Semiconductor(material) Toxicidad Trabajador Taiwan Aparato genital hembra patología Medicina ocupacional Solvente orgánico Asia
Classification
Pascal
002 Biological and medical sciences / 002B Medical sciences / 002B03 Toxicology / 002B03L Chemical and industrial products toxicology. Toxic occupational diseases / 002B03L04 Solvents

Discipline
Toxicology
Origin
Inist-CNRS
Database
PASCAL
INIST identifier
17000741

Sauf mention contraire ci-dessus, le contenu de cette notice bibliographique peut être utilisé dans le cadre d’une licence CC BY 4.0 Inist-CNRS / Unless otherwise stated above, the content of this bibliographic record may be used under a CC BY 4.0 licence by Inist-CNRS / A menos que se haya señalado antes, el contenido de este registro bibliográfico puede ser utilizado al amparo de una licencia CC BY 4.0 Inist-CNRS

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