Full-chip lithography simulation and design analysis : How OPC is changing IC design
- Autor
- SPENCE, Chris1
[1] Advanced Micro Devices, 1 AMD Place, Sunnyvale, CA 94088-3453, United States - Titulo de la conferencia
- Advances in resist technology and processing XXII (San Jose CA, 28 February - 2 March 2005)
- Nombre de la conferencia
- Advances in resist technology and processing. Conference (22 ; San Jose CA 2005-02-28)
- Autor ( monografía)
- Sturtevant, John L (Editor)
International Society for Optical Engineering, Bellingham WA, United States (Organiser of meeting) - Fuente
SPIE proceedings series. 2005 ; 2Vol ; Part 1, xix-xxxii ; ref : 30 ref
- ISBN
- 0-8194-5733-7
- Campo Científico
- Electronics; Optics; Physics; Telecommunications
- Editor
- SPIE, Bellingham WA
- País de la publicación
- International
- Tipo de documento
- Conference Paper
- Idioma
- English
- Palabra clave (fr)
- Article synthèse Conception circuit intégré Effet proximité Fabrication microélectronique Lithographie Procédé fabrication Production masse Répétabilité Correction optique proximité
- Palabra clave (in)
- Review Integrated circuit design Proximity effect Microelectronic fabrication Lithography Manufacturing process Mass production Repeatability Optical proximity correction
- Palabra clave (es)
- Artículo síntesis Efecto proximidad Fabricación microeléctrica Litografía Procedimiento fabricación Producción en masa Repetibilidad
- Clasificación
- Pascal
- 001 Exact sciences and technology / 001D Applied sciences / 001D03 Electronics / 001D03F Semiconductor electronics. Microelectronics. Optoelectronics. Solid state devices / 001D03F06 Integrated circuits / 001D03F06A Design. Technologies. Operation analysis. Testing
- Pascal
- 001 Exact sciences and technology / 001D Applied sciences / 001D03 Electronics / 001D03F Semiconductor electronics. Microelectronics. Optoelectronics. Solid state devices / 001D03F17 Microelectronic fabrication (materials and surfaces technology)
- Disciplina
- Electronics
- Procedencia
- Inist-CNRS
- Base de datos
- PASCAL
- Identificador INIST
- 17095764
Sauf mention contraire ci-dessus, le contenu de cette notice bibliographique peut être utilisé dans le cadre d’une licence CC BY 4.0 Inist-CNRS / Unless otherwise stated above, the content of this bibliographic record may be used under a CC BY 4.0 licence by Inist-CNRS / A menos que se haya señalado antes, el contenido de este registro bibliográfico puede ser utilizado al amparo de una licencia CC BY 4.0 Inist-CNRS
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