Preparation and characterization of hydrogenated carbon nitride films synthesized by dual DC-RF plasma system
- Author
- JUNYING HAO1 2 ; TAO XU1 ; WEIMIN LIU1
[1] State Key Laboratory of Solid Lubrication, Lanzhou Institute of Chemical Physics, Chinese Academy of Sciences, Lanzhou 730000, China
[2] Graduate University of Chinese Academy of Science, Beijing 100039, China - Source
Materials science & engineering. A, Structural materials : properties, microstructure and processing. 2005, Vol 408, Num 1-2, pp 297-302, 6 p ; ref : 37 ref
- ISSN
- 0921-5093
- Scientific domain
- Crystallography; Chemical industry parachemical industry; Metallurgy, welding; Condensed state physics
- Publisher
- Elsevier, Amsterdam
- Publication country
- Netherlands
- Document type
- Article
- Language
- English
- Author keyword
- Carbon nitride films Composition Mechanical properties PECVD
- Keyword (fr)
- Addition hydrogène Carbone nitrure Microscopie force atomique Microscopie électronique transmission Microstructure Méthode PECVD Nanoindentation Radiofréquence Spectre IR Spectre Raman Spectre photoélectron RX Spectre transformée Fourier 8115G Si
- Keyword (en)
- Hydrogen additions Carbon nitrides Atomic force microscopy Transmission electron microscopy Microstructure PECVD Nanoindentation Radiofrequency Infrared spectra Raman spectra X-ray photoelectron spectra Fourier transform spectra
- Keyword (es)
- Nanoindentacion Radiofrecuencia
- Classification
- Pascal
- 001 Exact sciences and technology / 001B Physics / 001B80 Cross-disciplinary physics: materials science; rheology / 001B80A Materials science / 001B80A15 Methods of deposition of films and coatings; film growth and epitaxy / 001B80A15G Chemical vapor deposition (including plasma-enhanced cvd, mocvd, etc.)
- Discipline
- Physics and materials science
- Origin
- Inist-CNRS
- Database
- PASCAL
- INIST identifier
- 17258677
Sauf mention contraire ci-dessus, le contenu de cette notice bibliographique peut être utilisé dans le cadre d’une licence CC BY 4.0 Inist-CNRS / Unless otherwise stated above, the content of this bibliographic record may be used under a CC BY 4.0 licence by Inist-CNRS / A menos que se haya señalado antes, el contenido de este registro bibliográfico puede ser utilizado al amparo de una licencia CC BY 4.0 Inist-CNRS
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DOI
10.1016/j.msea.2005.08.146 
https://dx.doi.org/10.1016/j.msea.2005.08.146
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