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Initiated CVD of poly(methyl methacrylate) thin films

Author
CHAN, Kelvin1 ; GLEASON, Karen K1
[1] Department of Chemical Engineering, Massachusetts Institute of Technology, Cambridge, MA 02139, United States
Source

Chemical vapor deposition (Print). 2005, Vol 11, Num 10, pp 437-443, 7 p ; ref : 45 ref

ISSN
0948-1907
Scientific domain
Chemistry; Crystallography
Publisher
Wiley-VCH, Weinheim
Publication country
Germany
Document type
Article
Language
English
Author keyword
Free-radical polymerization Poly(methyl methacrylate). Hot-filament CVD
Keyword (fr)
Amorceur Dépôt chimique phase vapeur Etude expérimentale Fil chaud Film Méthacrylate de méthyle polymère Polymérisation radicalaire Résonance magnétique nucléaire Rétention Spectre IR Spectre photoélectron RX Spectre transformée Fourier Substrat Si Composé organique
Keyword (en)
Initiator CVD Experimental study Hot wire Films PMMA Free radical polymerization Nuclear magnetic resonance Retention Infrared spectra X-ray photoelectron spectra Fourier transform spectra Organic compounds
Keyword (es)
Cebador Hilo caliente Polimerización radicalar
Classification
Pascal
001 Exact sciences and technology / 001B Physics / 001B80 Cross-disciplinary physics: materials science; rheology / 001B80A Materials science / 001B80A15 Methods of deposition of films and coatings; film growth and epitaxy / 001B80A15G Chemical vapor deposition (including plasma-enhanced cvd, mocvd, etc.)

Pacs
8115G Chemical vapor deposition (including plasma-enhanced CVD, MOCVD, etc.)

Discipline
Physics and materials science
Origin
Inist-CNRS
Database
PASCAL
INIST identifier
17348679

Sauf mention contraire ci-dessus, le contenu de cette notice bibliographique peut être utilisé dans le cadre d’une licence CC BY 4.0 Inist-CNRS / Unless otherwise stated above, the content of this bibliographic record may be used under a CC BY 4.0 licence by Inist-CNRS / A menos que se haya señalado antes, el contenido de este registro bibliográfico puede ser utilizado al amparo de una licencia CC BY 4.0 Inist-CNRS

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