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The influence of the ion current density on plasma nitriding process

Author
OCHOA, E. A1 ; FIGUEROA, C. A1 ; ALVAREZ, F1
[1] Instituto de Física Gleb Wataghin, Universidade Estadual de Campinas-UNICAMP, C. P. 6165, 13083-970 Campinas, SP, Brazil
Source

Surface & coatings technology. 2005, Vol 200, Num 7, pp 2165-2169, 5 p ; ref : 16 ref

CODEN
SCTEEJ
ISSN
0257-8972
Scientific domain
General chemistry, physical chemistry; Metallurgy, welding
Publisher
Elsevier, Lausanne
Publication country
Switzerland
Document type
Article
Language
English
Author keyword
62.20.Q 81.40.N;52.75.R Nitriding Hardness Ionic implantation
Keyword (fr)
Azote ion Densité courant Dureté Nitruration ionique Plasma Traitement surface Traitement thermochimique
Keyword (en)
Nitrogen ions Current density Hardness Ion nitriding Plasma Surface treatments Thermochemical treatment
Keyword (es)
Nitruración iónica Tratamiento termoquímico
Keyword (de)
Glimmnitrieren Thermochemische Behandlung
Classification
Pascal
001 Exact sciences and technology / 001B Physics / 001B80 Cross-disciplinary physics: materials science; rheology / 001B80A Materials science / 001B80A90 Other topics in materials science

Pascal
001 Exact sciences and technology / 001D Applied sciences / 001D11 Metals. Metallurgy / 001D11C Production techniques / 001D11C02 Heat treatment / 001D11C02E Thermochemical treatment and diffusion treatment

Discipline
Metals. Metallurgy Physics and materials science
Origin
Inist-CNRS
Database
PASCAL
INIST identifier
17432904

Sauf mention contraire ci-dessus, le contenu de cette notice bibliographique peut être utilisé dans le cadre d’une licence CC BY 4.0 Inist-CNRS / Unless otherwise stated above, the content of this bibliographic record may be used under a CC BY 4.0 licence by Inist-CNRS / A menos que se haya señalado antes, el contenido de este registro bibliográfico puede ser utilizado al amparo de una licencia CC BY 4.0 Inist-CNRS

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