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Influence of the polymer dielectric characteristics on the performance of a quaterthiophene organic field-effect transistor

Author
NARAYANAN UNNI, K. N1 ; DABOS-SEIGNON, Sylvie1 ; NUNZI, Jean-Michel1
[1] Laboratoire des Proprietés Optiques des Matériaux et Applications, UMR CNRS 6136, Université Angers, 2 Bd. Lavoisier, 49045 Angers, France
Source

Journal of materials science. 2006, Vol 41, Num 2, pp 317-322, 6 p ; ref : 22 ref

CODEN
JMTSAS
ISSN
0022-2461
Scientific domain
Chemical industry parachemical industry; Metallurgy, welding; Condensed state physics; Polymers, paint and wood industries
Publisher
Springer, Heidelberg
Publication country
Germany
Document type
Article
Language
English
Keyword (fr)
Caractéristique fonctionnement Constante diélectrique Courant fuite Densité état Diélectrique Evaluation performance Grille transistor Semiconducteur organique Seuil tension Structure surface Thiophène dérivé Transistor effet champ
Keyword (en)
Performance characteristic Permittivity Leakage current Density of states Dielectric materials Performance evaluation Transistor gate Organic semiconductors Voltage threshold Surface structure Thiophene derivatives Field effect transistor
Keyword (es)
Característica funcionamiento Constante dieléctrica Corriente escape Densidad estado Dieléctrico Evaluación prestación Rejilla transistor Umbral tensión Estructura superficie Tiofeno derivado Transistor efecto campo
Classification
Pascal
001 Exact sciences and technology / 001D Applied sciences / 001D03 Electronics / 001D03F Semiconductor electronics. Microelectronics. Optoelectronics. Solid state devices / 001D03F04 Transistors

Discipline
Electronics
Origin
Inist-CNRS
Database
PASCAL
INIST identifier
17540969

Sauf mention contraire ci-dessus, le contenu de cette notice bibliographique peut être utilisé dans le cadre d’une licence CC BY 4.0 Inist-CNRS / Unless otherwise stated above, the content of this bibliographic record may be used under a CC BY 4.0 licence by Inist-CNRS / A menos que se haya señalado antes, el contenido de este registro bibliográfico puede ser utilizado al amparo de una licencia CC BY 4.0 Inist-CNRS

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