SiOx films prepared using RF magnetron sputtering with a SiO target
- Author
- MIYAZAKI, H1 ; GOTO, T2
[1] Department of Material Science, Interdisciplinary Faculty of Science and Engineering, Shimane University, 1060, Nishikawatsu-cho, Matsue, Shimane 690-8504, Japan
[2] Institute for Materials Research, Tohoku University, 2-1-1, Katahira, Aoba-ku, Sendai, Miyagi, 980-8577, Japan - Source
Journal of non-crystalline solids. 2006, Vol 352, Num 4, pp 329-333, 5 p ; ref : 25 ref
- CODEN
- JNCSBJ
- ISSN
- 0022-3093
- Scientific domain
- Crystallography; Chemical industry parachemical industry; Metallurgy, welding; Condensed state physics
- Publisher
- Elsevier, Amsterdam
- Publication country
- Netherlands
- Document type
- Article
- Language
- English
- Author keyword
- 42.79.Wc 52.40.Hf 81.15.Cd Sputtering Absorption Defects Optical spectroscopy STEM/TEM Silica
- Keyword (fr)
- Coefficient absorption Couche mince Diffraction RX Frittage Microscopie électronique transmission Pulvérisation cathodique Pulvérisation haute fréquence Radiofréquence Silicium oxyde Spectre IR Spectre absorption Spectre photoélectron RX Stoechiométrie 8115C SiOx
- Keyword (en)
- Absorption coefficients Thin films XRD Sintering Transmission electron microscopy Cathode sputtering Radiofrequency sputtering Radiofrequency Silicon oxides Infrared spectra Absorption spectra X-ray photoelectron spectra Stoichiometry
- Keyword (es)
- Pulverización alta frecuencia Radiofrecuencia
- Classification
- Pascal
- 001 Exact sciences and technology / 001B Physics / 001B80 Cross-disciplinary physics: materials science; rheology / 001B80A Materials science / 001B80A15 Methods of deposition of films and coatings; film growth and epitaxy / 001B80A15C Deposition by sputtering
- Discipline
- Physics and materials science
- Origin
- Inist-CNRS
- Database
- PASCAL
- INIST identifier
- 17572921
Sauf mention contraire ci-dessus, le contenu de cette notice bibliographique peut être utilisé dans le cadre d’une licence CC BY 4.0 Inist-CNRS / Unless otherwise stated above, the content of this bibliographic record may be used under a CC BY 4.0 licence by Inist-CNRS / A menos que se haya señalado antes, el contenido de este registro bibliográfico puede ser utilizado al amparo de una licencia CC BY 4.0 Inist-CNRS
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DOI
10.1016/j.jnoncrysol.2005.12.008 
https://dx.doi.org/10.1016/j.jnoncrysol.2005.12.008
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