Structural and morphological characterization of chemically deposited silver films
- Author
- ESTRADA-RAYGOZA, I. C1 ; SOTELO-LERMA, M1 ; RAMIREZ-BON, R2
[1] Centro de Investigación en Polimeros y Materiales, Universidad de Sonora, Apdo. Postal 130, 83190 Hermosillo, Son, Mexico
[2] Centro de Investigación y Estudios Avanzados del IPN, Unidad Querétaro, Apdo. Postal 1-798, 76001 Querétaro, Qro, Mexico - Source
The Journal of physics and chemistry of solids. 2006, Vol 67, Num 4, pp 782-788, 7 p ; ref : 32 ref
- ISSN
- 0022-3697
- Scientific domain
- Crystallography; Condensed state physics
- Publisher
- Elsevier, Oxford
- Publication country
- United Kingdom
- Document type
- Article
- Language
- English
- Author keyword
- A. Metal B. Chemical synthesis C. X-ray diffraction D. Diffusion D. Microstructure
- Keyword (fr)
- Adhérence Analyse contrainte Argent Couche mince Diffraction RX Dépôt bain chimique Microscopie force atomique Microscopie électronique balayage Microstructure Réseau cubique Texture 8115
- Keyword (en)
- Adhesion Stress analysis Silver Thin films XRD Chemical bath deposition Atomic force microscopy Scanning electron microscopy Microstructure Cubic lattices Texture
- Keyword (es)
- Depósito baño químico
- Classification
- Pascal
- 001 Exact sciences and technology / 001B Physics / 001B80 Cross-disciplinary physics: materials science; rheology / 001B80A Materials science / 001B80A15 Methods of deposition of films and coatings; film growth and epitaxy
- Discipline
- Physics and materials science
- Origin
- Inist-CNRS
- Database
- PASCAL
- INIST identifier
- 17647484
Sauf mention contraire ci-dessus, le contenu de cette notice bibliographique peut être utilisé dans le cadre d’une licence CC BY 4.0 Inist-CNRS / Unless otherwise stated above, the content of this bibliographic record may be used under a CC BY 4.0 licence by Inist-CNRS / A menos que se haya señalado antes, el contenido de este registro bibliográfico puede ser utilizado al amparo de una licencia CC BY 4.0 Inist-CNRS
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DOI
10.1016/j.jpcs.2005.10.183 
https://dx.doi.org/10.1016/j.jpcs.2005.10.183
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