Sheath potential difference studies in low-pressure high-frequency capacitive RF plasma as a fundamental research for ion energy impinging on the material surface
- Author
- LI, Zhi-Gang1 ; YUCHENG DING1
[1] The State Key Laboratory for Manufacturing Systems Engineering, Xi'an Jiaotong University, Xi'an 710049, China - Source
Surface & coatings technology. 2006, Vol 200, Num 18-19, pp 5655-5662, 8 p ; ref : 30 ref
- CODEN
- SCTEEJ
- ISSN
- 0257-8972
- Scientific domain
- General chemistry, physical chemistry; Metallurgy, welding
- Publisher
- Elsevier, Lausanne
- Publication country
- Switzerland
- Document type
- Article
- Language
- English
- Author keyword
- 52.40.Kh Plasma sheaths; 52.40.Hf Plasma-material interactions boundary layer effects; 52.80.Pi High-frequency and RF discharges RF sheath; Presheath; Potential difference; Ion energy
- Keyword (fr)
- Basse pression Energie surface Plasma Potentiel Traitement surface
- Keyword (en)
- Low pressure Surface energy Plasma Potentials Surface treatments
- Classification
- Pascal
- 001 Exact sciences and technology / 001B Physics / 001B80 Cross-disciplinary physics: materials science; rheology / 001B80A Materials science / 001B80A90 Other topics in materials science
- Discipline
- Physics and materials science
- Origin
- Inist-CNRS
- Database
- PASCAL
- INIST identifier
- 17665586
Sauf mention contraire ci-dessus, le contenu de cette notice bibliographique peut être utilisé dans le cadre d’une licence CC BY 4.0 Inist-CNRS / Unless otherwise stated above, the content of this bibliographic record may be used under a CC BY 4.0 licence by Inist-CNRS / A menos que se haya señalado antes, el contenido de este registro bibliográfico puede ser utilizado al amparo de una licencia CC BY 4.0 Inist-CNRS
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DOI
10.1016/j.surfcoat.2005.08.001 
https://dx.doi.org/10.1016/j.surfcoat.2005.08.001
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