Pattern replication of 100 nm to millimeter-scale features by thermal nanoimprint lithography
- Author
- BO CUI1 ; VERES, Teodor1
[1] Industrial Materials Institute, National Research Council of Canada, 75 de Mortagne Boulevard, Boucherville, QC J4B6 Y4, Canada - Conference title
- Proceedings of the 31st International Conference on Micro- and Nano-Engineering: 19-22 September 2005, Vienna, Austria
- Conference name
- MNE 2005 International Conference on Micro- and Nano-Engineering (31 ; Vienna 2005-09-19)
- Author (monograph)
- LOESCHNER, Hans (Editor)1
[1] IMS Nanofabrication Vienna, Austria - Source
Microelectronic engineering. 2006, Vol 83, Num 4-9, pp 902-905, 4 p ; ref : 10 ref
- CODEN
- MIENEF
- ISSN
- 0167-9317
- Scientific domain
- Electronics
- Publisher
- Elsevier Science, Amsterdam
- Publication country
- Netherlands
- Document type
- Conference Paper
- Language
- English
- Author keyword
- Hot embossing Liftoff Pattern replication Polymer viscosity Thermal nanoimprint lithography
- Keyword (fr)
- A chaud Décollement épitaxique Fabrication microélectronique Formation motif Gravure ionique réactive Largeur raie Nanolithographie Polymère Réplication Résist
- Keyword (en)
- Hot process Lift off Microelectronic fabrication Patterning Reactive ion etching Line width Nanolithography Polymer Replication Resist
- Keyword (es)
- En caliente Desprendimiento epitáxico Fabricación microeléctrica Formacíon motivo Grabado iónico reactivo Anchura raya espectral Polímero Replicación Resistencia
- Classification
- Pascal
- 001 Exact sciences and technology / 001D Applied sciences / 001D03 Electronics / 001D03F Semiconductor electronics. Microelectronics. Optoelectronics. Solid state devices / 001D03F17 Microelectronic fabrication (materials and surfaces technology)
- Discipline
- Electronics
- Origin
- Inist-CNRS
- Database
- PASCAL
- INIST identifier
- 17773422
Sauf mention contraire ci-dessus, le contenu de cette notice bibliographique peut être utilisé dans le cadre d’une licence CC BY 4.0 Inist-CNRS / Unless otherwise stated above, the content of this bibliographic record may be used under a CC BY 4.0 licence by Inist-CNRS / A menos que se haya señalado antes, el contenido de este registro bibliográfico puede ser utilizado al amparo de una licencia CC BY 4.0 Inist-CNRS
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DOI
10.1016/j.mee.2006.01.013 
https://dx.doi.org/10.1016/j.mee.2006.01.013
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