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Second order sharp-interface and thin-interface asymptotic analyses and error minimization for phase-field descriptions of two-sided dilute binary alloy solidification

Author
GOPINATH, Arvind1 ; ARMSTRONG, Robert C2 ; BROWN, Robert A2
[1] Division of Engineering and Applied Sciences, Harvard University, Cambridge, MA 02138, United States
[2] Department of Chemical Engineering, Massachusetts Institute of Technology, Cambridge, MA 02139, United States
Source

Journal of crystal growth. 2006, Vol 291, Num 1, pp 272-289, 18 p ; ref : 12 ref

CODEN
JCRGAE
ISSN
0022-0248
Scientific domain
Crystallography; Geology; Metallurgy, welding
Publisher
Elsevier, Amsterdam
Publication country
Netherlands
Document type
Article
Language
English
Author keyword
81.30.Fb A1. Anti-trapping solutal flux A2. Phase-field models A3. Two-sided model Al. Directional solidification Bl. Dilute binary alloys
Keyword (fr)
Alliage binaire Cinétique Diffusivité Epaisseur Etude théorique Interface Minimisation Régime permanent Solidification Théorie asymptotique Modèle champ phase
Keyword (en)
Binary alloys Kinetics Diffusivity Thickness Theoretical study Interfaces Minimization Steady state Solidification Asymptotic theory Phase field model
Keyword (es)
Régimen permanente
Classification
Pascal
001 Exact sciences and technology / 001B Physics / 001B80 Cross-disciplinary physics: materials science; rheology / 001B80A Materials science / 001B80A30 Phase diagrams and microstructures developed by solidification and solid-solid phase transformations / 001B80A30F Solidification

Pacs
8130F Solidification

Discipline
Physics and materials science
Origin
Inist-CNRS
Database
PASCAL
INIST identifier
17775357

Sauf mention contraire ci-dessus, le contenu de cette notice bibliographique peut être utilisé dans le cadre d’une licence CC BY 4.0 Inist-CNRS / Unless otherwise stated above, the content of this bibliographic record may be used under a CC BY 4.0 licence by Inist-CNRS / A menos que se haya señalado antes, el contenido de este registro bibliográfico puede ser utilizado al amparo de una licencia CC BY 4.0 Inist-CNRS

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