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Seeded-growth approach to selective metallization of microcontact-printed patterns

Author
MEWE, Agnes A1 ; STEFAN KOOIJ, E1 ; POELSEMA, Bene1
[1] University of Twente, MESA+ Institute for Nanotechnology, P.O. Box 217, 7500 AE Enschede, Netherlands
Source

Langmuir. 2006, Vol 22, Num 13, pp 5584-5587, 4 p ; ref : 38 ref

CODEN
LANGD5
ISSN
0743-7463
Scientific domain
Biochemistry, molecular biology, biophysics; General chemistry, physical chemistry; Nanotechnologies, nanostructures, nanoobjects; Polymers, paint and wood industries
Publisher
American Chemical Society, Washington, DC
Publication country
United States
Document type
Article
Language
English
Keyword (fr)
Caractérisation Croissance Ellipsométrie spectroscopique Epaisseur Impression Microscopie électronique balayage Microstructure Nanocristal Nanoparticule Or Oxyde Percolation Rugosité Silicium Structure Substrat Métal transition
Keyword (en)
Characterization Growth Spectroscopic ellipsometry Thickness Printing Scanning electron microscopy Microstructure Nanocrystal Nanoparticle Gold Oxides Percolation Roughness Silicon Structure Substrate Transition metal
Keyword (es)
Caracterización Crecimiento Elipsometría espectroscópica Espesor Impresión Microscopía electrónica barrido Microestructura Nanocristal Nanopartícula Oro Óxido Percolación Rugosidad Silicio Estructura Substrato Metal transición
Classification
Pascal
001 Exact sciences and technology / 001C Chemistry / 001C01 General and physical chemistry / 001C01J Colloidal state and disperse state / 001C01J02 Physical and chemical studies. Granulometry. Electrokinetic phenomena

Discipline
General chemistry and physical chemistry
Origin
Inist-CNRS
Database
PASCAL
INIST identifier
17877968

Sauf mention contraire ci-dessus, le contenu de cette notice bibliographique peut être utilisé dans le cadre d’une licence CC BY 4.0 Inist-CNRS / Unless otherwise stated above, the content of this bibliographic record may be used under a CC BY 4.0 licence by Inist-CNRS / A menos que se haya señalado antes, el contenido de este registro bibliográfico puede ser utilizado al amparo de una licencia CC BY 4.0 Inist-CNRS

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