Ink dependence of poly(dimethylsiloxane) contamination in microcontact printing
- Author
- SHARPE, Ruben B. A1 ; BURDINSKI, Dirk2 ; VAN DER MAREL, Cees2 ; JANSEN, Jan A. J2 ; HUSKENS, Jurriaan1 ; ZANDVLIET, Harold J. W1 ; REINHOUDT, David N1 ; POELSEMA, Bene1
[1] MESA+ Institute for Nanotechnology and Faculty of Science and Technology, University of Twente, P.O. Box 217, 7500 AE Enschede, Netherlands
[2] Philips Research, High Tech Campus Eindhoven, 5656 AE Eindhoven, Netherlands - Source
Langmuir. 2006, Vol 22, Num 13, pp 5945-5951, 7 p ; ref : 38 ref
- Publisher
- American Chemical Society, Washington, DC
- Publication country
- United States
- Document type
- Article
- Language
- English
- Keyword (fr)
- Alcanethiol Contamination Encre Fragment Impression Masse moléculaire Microscopie force Rayon X Spectrométrie IR Spectrométrie photoélectron Stabilité Substrat
- Keyword (en)
- Alkanethiol Contamination Ink Fragment Printing Molecular mass Force microscopy X ray Infrared spectrometry Photoelectron spectrometry Stability Substrate
- Keyword (es)
- Alcanotiol Contaminación Tinta Fragmento Impresión Masa molecular Microscopía fuerza Rayos X Espectrometría IR Espectrometría fotoelectrón Estabilidad Substrato
- Classification
- Discipline
- General chemistry and physical chemistry
- Origin
- Inist-CNRS
- Database
- PASCAL
- INIST identifier
- 17878022
Sauf mention contraire ci-dessus, le contenu de cette notice bibliographique peut être utilisé dans le cadre d’une licence CC BY 4.0 Inist-CNRS / Unless otherwise stated above, the content of this bibliographic record may be used under a CC BY 4.0 licence by Inist-CNRS / A menos que se haya señalado antes, el contenido de este registro bibliográfico puede ser utilizado al amparo de una licencia CC BY 4.0 Inist-CNRS
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DOI
10.1021/la053298l 
https://dx.doi.org/10.1021/la053298l
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