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Silicide formation in Co/Si system investigated by depth-resolved positron annihilation and X-ray diffraction

Author
ABHAYA, S1 ; VENUGOPAL RAO, G1 ; KALAVATHI, S1 ; SASTRY, V. S1 ; AMARENDRA, G1
[1] Materials Science Division, Indira Gandhi Centre for Atomic Research, Kalpakkam 603 102, India
Source

Surface science. 2006, Vol 600, Num 13, pp 2762-2765, 4 p ; ref : 15 ref

CODEN
SUSCAS
ISSN
0039-6028
Scientific domain
General chemistry, physical chemistry; Nanotechnologies, nanostructures, nanoobjects; Condensed state physics; Polymers, paint and wood industries
Publisher
Elsevier Science, Amsterdam / Elsevier Science, Lausanne / Elsevier Science, New York, NY
Publication country
Netherlands
Document type
Article
Language
English
Author keyword
Cobalt silicides Positron spectroscopy X-ray diffraction
Keyword (fr)
Annihilation positon Cobalt siliciure Diffraction RX Silicium Si
Keyword (en)
Positron annihilation Cobalt silicides XRD Silicon
Classification
Pascal
001 Exact sciences and technology / 001B Physics / 001B60 Condensed matter: structure, mechanical and thermal properties

Pascal
001 Exact sciences and technology / 001B Physics / 001B70 Condensed matter: electronic structure, electrical, magnetic, and optical properties

Pascal
001 Exact sciences and technology / 001B Physics / 001B80 Cross-disciplinary physics: materials science; rheology

Discipline
Physics and materials science Physics of condensed state : electronic structure, electrical, magnetic and optical properties Physics of condensed state : structure, mechanical and thermal properties
Origin
Inist-CNRS
Database
PASCAL
INIST identifier
17899657

Sauf mention contraire ci-dessus, le contenu de cette notice bibliographique peut être utilisé dans le cadre d’une licence CC BY 4.0 Inist-CNRS / Unless otherwise stated above, the content of this bibliographic record may be used under a CC BY 4.0 licence by Inist-CNRS / A menos que se haya señalado antes, el contenido de este registro bibliográfico puede ser utilizado al amparo de una licencia CC BY 4.0 Inist-CNRS

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