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The preparation of polyaniline intercalated MoO3 thin film and its sensitivity to volatile organic compounds

Author
JUNZHONG WANG1 ; MATSUBARA, Ichiro1 ; MURAYAMA, Norimitsu1 ; WOOSUCK, Shin1 ; IZU, Noriya1
[1] National Institute of Advanced Industrial Science and Technology, Shimo-Shidami, Moriyama-ku, Nagoya 463-8560, Japan
Source

Thin solid films. 2006, Vol 514, Num 1-2, pp 329-333, 5 p ; ref : 28 ref

CODEN
THSFAP
ISSN
0040-6090
Scientific domain
Crystallography; Electronics; Metallurgy, welding; Condensed state physics
Publisher
Elsevier Science, Lausanne
Publication country
Switzerland
Document type
Article
Language
English
Author keyword
Chemical vapour deposition (CVD) Molybdenum oxide Polymers Sensors
Keyword (fr)
Aniline polymère Capteur Composé binaire Composé insertion Conductivité électrique Cristallisation Diffraction RX Dépôt chimique phase vapeur Echange ion Effet concentration Etude expérimentale Film Microscopie électronique balayage Molybdène oxyde Orientation préférentielle Résistivité électrique Mo O MoO3 Substrat LaAlO3 Composé minéral Composé organique Métal transition composé
Keyword (en)
Polyanilines Sensors Binary compounds Intercalation compounds Electrical conductivity Crystallization XRD CVD Ion exchange Quantity ratio Experimental study Films Scanning electron microscopy Molybdenum oxides Preferred orientation Electric resistivity Inorganic compounds Organic compounds Transition element compounds
Keyword (es)
Orientación preferencial
Classification
Pascal
001 Exact sciences and technology / 001B Physics / 001B80 Cross-disciplinary physics: materials science; rheology / 001B80A Materials science / 001B80A15 Methods of deposition of films and coatings; film growth and epitaxy / 001B80A15G Chemical vapor deposition (including plasma-enhanced cvd, mocvd, etc.)

Pacs
8115G Chemical vapor deposition (including plasma-enhanced CVD, MOCVD, etc.)

Discipline
Physics and materials science
Origin
Inist-CNRS
Database
PASCAL
INIST identifier
18005333

Sauf mention contraire ci-dessus, le contenu de cette notice bibliographique peut être utilisé dans le cadre d’une licence CC BY 4.0 Inist-CNRS / Unless otherwise stated above, the content of this bibliographic record may be used under a CC BY 4.0 licence by Inist-CNRS / A menos que se haya señalado antes, el contenido de este registro bibliográfico puede ser utilizado al amparo de una licencia CC BY 4.0 Inist-CNRS

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