Refractory α-SiAlON containing La2O3
- Author
- SHUBA, Roman1 ; CHEN, I.-Wei1
[1] Department of Materials Science and Engineering, University of Pennsylvania, Philadelphia, Pennsylvania 19104-6272, United States - Source
Journal of the American Ceramic Society. 2006, Vol 89, Num 9, pp 2860-2868, 9 p ; ref : 47 ref
- CODEN
- JACTAW
- ISSN
- 0002-7820
- Scientific domain
- Chemical industry parachemical industry
- Publisher
- Blackwell, Malden,MA
- Publication country
- United States
- Document type
- Article
- Language
- English
- Keyword (fr)
- Additif Aluminium nitrure Céramique technique Etude expérimentale Fabrication Lanthane oxyde Microscopie électronique balayage Oxynitrure Phase alpha Propriété mécanique Relation fabrication propriété Réfractaire Sialon Silicium nitrure Al N O Si La O La2O3 SiAlON
- Keyword (en)
- Additive Aluminium nitride Technical ceramics Experimental study Manufacturing Lanthanum oxide Scanning electron microscopy Nitrides oxides Alpha phase Mechanical properties Fabrication property relation Refractory Sialon Silicon nitride
- Keyword (es)
- Aditivo Aluminio nitruro Cerámica técnica Estudio experimental Fabricación Lantano óxido Microscopía electrónica barrido Oxinitruro Fase alfa Propiedad mecánica Relación fabricación propiedad Refractario Sialon Silicio nitruro
- Classification
- Pascal
- 001 Exact sciences and technology / 001D Applied sciences / 001D08 Chemical industry and chemicals / 001D08B Building materials. Ceramics. Glasses / 001D08B05 Refractory products / 001D08B05D Special refractories
- Discipline
- Chemical and parachemical industries
- Origin
- Inist-CNRS
- Database
- PASCAL
- INIST identifier
- 18106941
Sauf mention contraire ci-dessus, le contenu de cette notice bibliographique peut être utilisé dans le cadre d’une licence CC BY 4.0 Inist-CNRS / Unless otherwise stated above, the content of this bibliographic record may be used under a CC BY 4.0 licence by Inist-CNRS / A menos que se haya señalado antes, el contenido de este registro bibliográfico puede ser utilizado al amparo de una licencia CC BY 4.0 Inist-CNRS
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DOI
10.1111/j.1551-2916.2006.01159.x 
https://dx.doi.org/10.1111/j.1551-2916.2006.01159.x
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