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Fabrication of nanoporous templates from diblock copolymer thin films on alkylchlorosilane-neutralized surfaces

Author
NIEMZ, Angelika1 ; BANDYOPADHYAY, Krisanu1 2 ; TAN, Eric1 ; CHA, Kitty2 ; BAKER, Shenda M2
[1] Keck Graduate Institute, 535 Watson Drive, Claremont, California 91711, United States
[2] Department of Chemistry, 301 East 12th Street, Harvey Mudd College, Claremont, California 91711, United States
Source

Langmuir. 2006, Vol 22, Num 26, pp 11092-11096, 5 p ; ref : 29 ref

CODEN
LANGD5
ISSN
0743-7463
Scientific domain
Biochemistry, molecular biology, biophysics; General chemistry, physical chemistry; Nanotechnologies, nanostructures, nanoobjects; Polymers, paint and wood industries
Publisher
American Chemical Society, Washington, DC
Publication country
United States
Document type
Article
Language
English
Keyword (fr)
Autoassemblage Copolymère biséquencé Couche mince Couche monomoléculaire Densité Energie Greffage Matériau poreux Méthacrylate copolymère Neutralisation Orientation Relation ordre Silicium Substrat Agent structurant Nanoporosité
Keyword (en)
Self assembly Diblock copolymer Thin film Monolayer Density Energy Grafting Porous material Methacrylate copolymer Neutralization Orientation Ordering Silicon Substrate Template Nanoporosity
Keyword (es)
Autoensamble Copolímero bisecuencia Capa fina Capa monomolecular Densidad Energía Injerto Material poroso Metacrilato copolímero Neutralización Orientación Relación orden Silicio Substrato Nanoporosidad
Classification
Pascal
001 Exact sciences and technology / 001C Chemistry / 001C01 General and physical chemistry / 001C01J Colloidal state and disperse state / 001C01J08 Porous materials

Discipline
General chemistry and physical chemistry
Origin
Inist-CNRS
Database
PASCAL
INIST identifier
18352416

Sauf mention contraire ci-dessus, le contenu de cette notice bibliographique peut être utilisé dans le cadre d’une licence CC BY 4.0 Inist-CNRS / Unless otherwise stated above, the content of this bibliographic record may be used under a CC BY 4.0 licence by Inist-CNRS / A menos que se haya señalado antes, el contenido de este registro bibliográfico puede ser utilizado al amparo de una licencia CC BY 4.0 Inist-CNRS

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