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Modelling of reactive sputtering processes involving two separated metallic targets

Author
MARTIN, N1 ; ROUSSELOT, C1
[1] Laboratoire de Métrologie des Interfaces Techniques (L.M.I.T.), Institut des Traitements de Surface de Franche-Comté (I.T.S.F.C.) 4, Place Lucien Tharradin, 25211 Montbeliard, France
Source

Surface & coatings technology. 1999, Vol 114, Num 2-3, pp 235-249 ; ref : 51 ref

CODEN
SCTEEJ
ISSN
0257-8972
Scientific domain
General chemistry, physical chemistry; Metallurgy, welding
Publisher
Elsevier, Lausanne
Publication country
Switzerland
Document type
Article
Language
English
Keyword (fr)
Cible multiple Couche mince Couche multimoléculaire Dépôt physique phase vapeur Etude théorique Modélisation Pulvérisation irradiation Pulvérisation réactive
Keyword (en)
Multiple target Thin films Multilayer Physical vapor deposition Theoretical study Modelling Sputtering Reactive sputtering
Keyword (es)
Blanco múltiple Capa multimolecular
Classification
Pascal
001 Exact sciences and technology / 001B Physics / 001B80 Cross-disciplinary physics: materials science; rheology / 001B80A Materials science / 001B80A15 Methods of deposition of films and coatings; film growth and epitaxy / 001B80A15C Deposition by sputtering

Pacs
8115C Deposition by sputtering

Discipline
Physics and materials science
Origin
Inist-CNRS
Database
PASCAL
INIST identifier
1838436

Sauf mention contraire ci-dessus, le contenu de cette notice bibliographique peut être utilisé dans le cadre d’une licence CC BY 4.0 Inist-CNRS / Unless otherwise stated above, the content of this bibliographic record may be used under a CC BY 4.0 licence by Inist-CNRS / A menos que se haya señalado antes, el contenido de este registro bibliográfico puede ser utilizado al amparo de una licencia CC BY 4.0 Inist-CNRS

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