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Real-time control of photoresist extinction coefficient uniformity in the microlithography process

Author
TAY, Arthur1 ; WENG KHUEN HO1 ; XIAODONG WU1
[1] Department of Electrical and Computer Engineering, National University of Singapore, 117576 Singapore, Singapore
Source

IEEE transactions on control systems technology. 2007, Vol 15, Num 1, pp 99-105, 7 p ; ref : 21 ref

CODEN
IETTE2
ISSN
1063-6536
Scientific domain
Control theory, operational research; Electrical engineering
Publisher
Institute of Electrical and Electronics Engineers, New York, NY
Publication country
United States
Document type
Article
Language
English
Author keyword
Lithography photoresist extinction coefficient photoresist processing real-time control temperature control
Keyword (fr)
Circuit intégré Commande proportionnelle intégrale Commande température Décomposition domaine Impression Lithographie Mesure température Optimisation Profilométrie Réseau électrique Temps réel Uniformité Dimension critique
Keyword (en)
Integrated circuit Integral proportional control Temperature control Domain decomposition Printing Lithography Temperature measurement Optimization Profilometry Electrical network Real time Uniformity Critical dimension
Keyword (es)
Circuito integrado Control PI Control temperatura Descomposición dominio Impresión Litografía Medida temperatura Optimización Perfilometría Red eléctrica Tiempo real Uniformidad Dimensión crítica
Classification
Pascal
001 Exact sciences and technology / 001D Applied sciences / 001D02 Computer science; control theory; systems / 001D02D Control theory. Systems

Discipline
Computer science : theoretical automation and systems
Origin
Inist-CNRS
Database
PASCAL
INIST identifier
18386546

Sauf mention contraire ci-dessus, le contenu de cette notice bibliographique peut être utilisé dans le cadre d’une licence CC BY 4.0 Inist-CNRS / Unless otherwise stated above, the content of this bibliographic record may be used under a CC BY 4.0 licence by Inist-CNRS / A menos que se haya señalado antes, el contenido de este registro bibliográfico puede ser utilizado al amparo de una licencia CC BY 4.0 Inist-CNRS

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