The analysis of carbon bonding environment in HWCVD deposited a-SiC:H films by XPS and raman spectroscopy
- Author
- SWAIN, Bibhu P1 2
[1] Department of Metallurgical Engineering and Materials Science. Indian Institute of Technology. Bombay, Mumbai, MH, India
[2] Samtel Centre for Display Technologies. Indian Institute of Technology, Kanpur, U.P, India - Source
Surface & coatings technology. 2006, Vol 201, Num 3-4, pp 1589-1593, 5 p ; ref : 31 ref
- CODEN
- SCTEEJ
- ISSN
- 0257-8972
- Scientific domain
- General chemistry, physical chemistry; Metallurgy, welding
- Publisher
- Elsevier, Lausanne
- Publication country
- Switzerland
- Document type
- Article
- Language
- English
- Author keyword
- FTIR HWCVD Raman spectroscopy UV-Vis spectroscopy XPS
- Keyword (fr)
- Spectrométrie Raman Traitement surface
- Keyword (en)
- Raman spectroscopy Surface treatments
- Classification
- Pascal
- 001 Exact sciences and technology / 001B Physics / 001B80 Cross-disciplinary physics: materials science; rheology / 001B80A Materials science / 001B80A90 Other topics in materials science
- Discipline
- Physics and materials science
- Origin
- Inist-CNRS
- Database
- PASCAL
- INIST identifier
- 18395259
Sauf mention contraire ci-dessus, le contenu de cette notice bibliographique peut être utilisé dans le cadre d’une licence CC BY 4.0 Inist-CNRS / Unless otherwise stated above, the content of this bibliographic record may be used under a CC BY 4.0 licence by Inist-CNRS / A menos que se haya señalado antes, el contenido de este registro bibliográfico puede ser utilizado al amparo de una licencia CC BY 4.0 Inist-CNRS
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DOI
10.1016/j.surfcoat.2006.02.029 
https://dx.doi.org/10.1016/j.surfcoat.2006.02.029
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