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Re-sharpenable thick CVD diamond-coated Si3N4 tools for hardmetal turning

Author
ALMEIDA, F. A1 ; FEMANDES, A. J. S2 ; SILVA, R. F1 ; OLIVEIRA, F. J1
[1] CICECO-Department of Ceramics and Glass Engineering, University of Aveiro, 3810-193 Aveiro, Portugal
[2] Department of Physics. University of Aveiro, 3810-193 Aveiro, Portugal
Source

Surface & coatings technology. 2006, Vol 201, Num 3-4, pp 1776-1782, 7 p ; ref : 19 ref

CODEN
SCTEEJ
ISSN
0257-8972
Scientific domain
General chemistry, physical chemistry; Metallurgy, welding
Publisher
Elsevier, Lausanne
Publication country
Switzerland
Document type
Article
Language
English
Author keyword
Direct coating Hardmetal Machining Sharpening Silicon nitride Thick CVD diamond film
Keyword (fr)
Couche mince Couche épaisse Diamant Dépôt chimique phase vapeur Matériau dur Métal dur Nitrure Outil coupe Outil diamant Plasma Revêtement non métallique Silicium nitrure Tournage Traitement surface Usinage
Keyword (en)
Thin film Thick film Diamond Chemical vapor deposition Hard material Hard metals Nitrides Cutting tool Diamond tool Plasma Non metal coating Silicon nitride Turning Surface treatment Machining
Keyword (es)
Capa fina Capa espesa Diamante Depósito químico fase vapor Material duro Nitruro Herramienta corte Diamante Plasma Revestimiento no metálico Silicio nitruro Torneado Tratamiento superficie Mecanizado
Keyword (de)
Duennschicht Diamant Chemisches Aufdampfen Hartstoff Nitrid Zerspanungswerkzeug Diamantwerkzeug Plasma Nichtmetallischer Ueberzug Siliciumnitrid Drehen Oberflaechenbehandlung Zerspanen
Classification
Pascal
001 Exact sciences and technology / 001D Applied sciences / 001D11 Metals. Metallurgy / 001D11C Production techniques / 001D11C06 Surface treatment / 001D11C06E Nonmetallic coatings

Discipline
Metals. Metallurgy
Origin
Inist-CNRS
Database
PASCAL
INIST identifier
18395285

Sauf mention contraire ci-dessus, le contenu de cette notice bibliographique peut être utilisé dans le cadre d’une licence CC BY 4.0 Inist-CNRS / Unless otherwise stated above, the content of this bibliographic record may be used under a CC BY 4.0 licence by Inist-CNRS / A menos que se haya señalado antes, el contenido de este registro bibliográfico puede ser utilizado al amparo de una licencia CC BY 4.0 Inist-CNRS

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