Reactive sputtering of hard nitride coatings using asymmetric-bipolar pulsed DC generator
- Author
- BARSHILIA, Harish C1 ; RAJAM, K. S1
[1] Surface Engineering Division, National Aerospace Laboratories, Post Bag No. 1779, Bangalore -560 017, India - Source
Surface & coatings technology. 2006, Vol 201, Num 3-4, pp 1827-1835, 9 p ; ref : 41 ref
- CODEN
- SCTEEJ
- ISSN
- 0257-8972
- Scientific domain
- General chemistry, physical chemistry; Metallurgy, welding
- Publisher
- Elsevier, Lausanne
- Publication country
- Switzerland
- Document type
- Article
- Language
- English
- Author keyword
- Asymmetric-bipolar pulsed DC generator Dielectric coatings Hard coatings Reactive sputtering Unbalanced magnetron
- Keyword (fr)
- Diélectrique Magnétron Nitrure Plasma Pulvérisation irradiation Pulvérisation réactive Revêtement dur Traitement surface
- Keyword (en)
- Dielectric materials Magnetron Nitrides Plasma Sputtering Reactive sputtering Hard coating Surface treatment
- Keyword (es)
- Dieléctrico Magnetrón Nitruro Plasma Pulverización irradiación Pulverización reactiva Revestimiento duro Tratamiento superficie
- Keyword (de)
- Dielektrisches Material Nitrid Plasma Sputtern Oberflaechenbehandlung
- Classification
- Pascal
- 001 Exact sciences and technology / 001D Applied sciences / 001D11 Metals. Metallurgy / 001D11C Production techniques / 001D11C06 Surface treatment
- Discipline
- Metals. Metallurgy
- Origin
- Inist-CNRS
- Database
- PASCAL
- INIST identifier
- 18395292
Sauf mention contraire ci-dessus, le contenu de cette notice bibliographique peut être utilisé dans le cadre d’une licence CC BY 4.0 Inist-CNRS / Unless otherwise stated above, the content of this bibliographic record may be used under a CC BY 4.0 licence by Inist-CNRS / A menos que se haya señalado antes, el contenido de este registro bibliográfico puede ser utilizado al amparo de una licencia CC BY 4.0 Inist-CNRS
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DOI
10.1016/j.surfcoat.2006.03.012 
https://dx.doi.org/10.1016/j.surfcoat.2006.03.012
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