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Fabrication of Cu/Cu2O composite nanowire arrays on Si via AAO template-mediated electrodeposition

Author
LEE, Yueh-Hsun1 ; LEU, Ing-Chi2 ; WU, Min-Tao1 ; YEN, Jung-Hsien1 ; FUNG, Kuan-Zong1
[1] Department of Materials Science and Engineering, National Cheng Kung University, Tainan, Taiwan, Province of China
[2] Department of Materials Science and Engineering, National United University, Miao-Li, Taiwan, Province of China
Source

Journal of alloys and compounds. 2007, Vol 427, Num 1-2, pp 213-218, 6 p ; ref : 15 ref

ISSN
0925-8388
Scientific domain
Inorganic chemistry; Crystallography; Metallurgy, welding; Condensed state physics
Publisher
Elsevier, Lausanne
Publication country
Switzerland
Document type
Article
Language
English
Author keyword
Composite materials Nanostructure materials
Keyword (fr)
Anodisation Couche interfaciale Cuivre oxyde Cuivre Dépôt électrolytique Matériau composite Microscopie électronique transmission Microstructure Métal transition Nanofil pH 8107V
Keyword (en)
Anodizing Interfacial layer Copper oxides Copper Electrodeposition Composite materials Transmission electron microscopy Microstructure Transition elements Nanowires pH value
Keyword (es)
Capa interfacial
Classification
Pascal
001 Exact sciences and technology / 001B Physics / 001B80 Cross-disciplinary physics: materials science; rheology / 001B80A Materials science / 001B80A07 Nanoscale materials and structures: fabrication and characterization / 001B80A07V Quantum wires

Discipline
Physics and materials science
Origin
Inist-CNRS
Database
PASCAL
INIST identifier
18423604

Sauf mention contraire ci-dessus, le contenu de cette notice bibliographique peut être utilisé dans le cadre d’une licence CC BY 4.0 Inist-CNRS / Unless otherwise stated above, the content of this bibliographic record may be used under a CC BY 4.0 licence by Inist-CNRS / A menos que se haya señalado antes, el contenido de este registro bibliográfico puede ser utilizado al amparo de una licencia CC BY 4.0 Inist-CNRS

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