Microstructure of direct current and pulse magnetron sputtered Cr-B coatings
- Author
- AUDRONIS, M1 ; KELLY, P. J2 ; LEYLAND, A1 ; MATTHEWS, A1
[1] Department of Engineering Materials, The University of Sheffield, Sir Robert Hadfield Building, Mappin Street, Sheffield, SI 3JD, United Kingdom
[2] Surface Engineering Group, Manchester Metropolitan University, Manchester, MI 5GD, United Kingdom - Source
Thin solid films. 2006, Vol 515, Num 4, pp 1511-1516, 6 p ; ref : 17 ref
- CODEN
- THSFAP
- ISSN
- 0040-6090
- Scientific domain
- Crystallography; Electronics; Metallurgy, welding; Condensed state physics
- Publisher
- Elsevier Science, Lausanne
- Publication country
- Switzerland
- Document type
- Article
- Language
- English
- Author keyword
- Chromium boride Chromium diboride Microstructure Nanostructure Pulsed magnetron sputtering Transmission electron microscopy
- Keyword (fr)
- Application industrielle Borure Chrome Conductivité thermique Conductivité électrique Couche mince Dureté Dépôt physique phase vapeur Dépôt pulvérisation Interface Microscopie électronique transmission Microscopie électronique Microstructure Mécanisme croissance Nanostructure Ordre courte distance Orientation préférentielle Propriété mécanique Pulvérisation cathodique Revêtement pulvérisation Résistance usure Structure fine 6855J 6860B 6860D 8115C
- Keyword (en)
- Industrial application Borides Chromium Thermal conductivity Electrical conductivity Thin films Hardness Physical vapor deposition Sputter deposition Interfaces Transmission electron microscopy Electron microscopy Microstructure Growth mechanism Nanostructures Short-range order Preferred orientation Mechanical properties Cathode sputtering Sputtered coatings Wear resistance Fine structure
- Keyword (es)
- Aplicación industrial Mecanismo crecimiento Orientación preferencial
- Classification
- Pascal
- 001 Exact sciences and technology / 001B Physics / 001B60 Condensed matter: structure, mechanical and thermal properties / 001B60H Surfaces and interfaces; thin films and whiskers (structure and nonelectronic properties) / 001B60H55 Thin film structure and morphology / 001B60H55J Structure and morphology; thickness
- Pascal
- 001 Exact sciences and technology / 001B Physics / 001B60 Condensed matter: structure, mechanical and thermal properties / 001B60H Surfaces and interfaces; thin films and whiskers (structure and nonelectronic properties) / 001B60H60 Physical properties of thin films, nonelectronic / 001B60H60B Mechanical and acoustical properties
- Pascal
- 001 Exact sciences and technology / 001B Physics / 001B60 Condensed matter: structure, mechanical and thermal properties / 001B60H Surfaces and interfaces; thin films and whiskers (structure and nonelectronic properties) / 001B60H60 Physical properties of thin films, nonelectronic / 001B60H60D Thermal stability; thermal effects
- Pascal
- 001 Exact sciences and technology / 001B Physics / 001B80 Cross-disciplinary physics: materials science; rheology / 001B80A Materials science / 001B80A15 Methods of deposition of films and coatings; film growth and epitaxy / 001B80A15C Deposition by sputtering
- Discipline
- Physics and materials science Physics of condensed state : structure, mechanical and thermal properties
- Origin
- Inist-CNRS
- Database
- PASCAL
- INIST identifier
- 18439944
Sauf mention contraire ci-dessus, le contenu de cette notice bibliographique peut être utilisé dans le cadre d’une licence CC BY 4.0 Inist-CNRS / Unless otherwise stated above, the content of this bibliographic record may be used under a CC BY 4.0 licence by Inist-CNRS / A menos que se haya señalado antes, el contenido de este registro bibliográfico puede ser utilizado al amparo de una licencia CC BY 4.0 Inist-CNRS
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DOI
10.1016/j.tsf.2006.04.026 
https://dx.doi.org/10.1016/j.tsf.2006.04.026
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