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Reactive direct current magnetron sputtering of tungsten oxide : A correlation between film properties and deposition pressure

Author
SALINGA, Christian1 ; KAPPERTZ, Oliver1 ; WUTTIG, Matthias1
[1] Physikalisches Institut der RWTH Aachen, Lehrstuhl für Physik neuer Materialien, 52056 Aachen, Germany
Source

Thin solid films. 2006, Vol 515, Num 4, pp 2760-2764, 5 p ; ref : 23 ref

CODEN
THSFAP
ISSN
0040-6090
Scientific domain
Crystallography; Electronics; Metallurgy, welding; Condensed state physics
Publisher
Elsevier Science, Lausanne
Publication country
Switzerland
Document type
Article
Language
English
Author keyword
42.79.Wc; 78.66.Bz; 52.75.Rx; 42.65.Pc Tungsten oxide; Optical coatings; Sputtering; Gasochromic switching
Keyword (fr)
Basse pression Catalyseur Commutation Couche mince Croissance film Effet pression Effet rayonnement Pulvérisation cathodique Revêtement optique Réflexion RX Résultat expérimental Taux croissance Tungstène oxyde Vitesse dépôt 6180 O W WO3
Keyword (en)
Low pressure Catalyst Switching Thin film Film growth Pressure effect Radiation effect Cathodic sputtering Optical coating X ray reflection Experimental result Growth rate Tungsten oxide Deposition rate
Keyword (es)
Baja presión Catalizador Conmutación Capa fina Efecto presión Efecto radiación Pulverización catódica Revestimiento óptico Resultado experimental Tasa crecimiento Wolframio óxido Velocidad deposición
Classification
Pascal
001 Exact sciences and technology / 001B Physics / 001B60 Condensed matter: structure, mechanical and thermal properties / 001B60A Structure of solids and liquids; crystallography / 001B60A80 Physical radiation effects, radiation damage

Pascal
001 Exact sciences and technology / 001C Chemistry / 001C01 General and physical chemistry / 001C01A Theory of reactions, general kinetics. Catalysis. Nomenclature, chemical documentation, computer chemistry / 001C01A03 Catalysis / 001C01A03A Catalysts: preparations and properties

Discipline
General chemistry and physical chemistry Physics of condensed state : structure, mechanical and thermal properties
Origin
Inist-CNRS
Database
PASCAL
INIST identifier
18440151

Sauf mention contraire ci-dessus, le contenu de cette notice bibliographique peut être utilisé dans le cadre d’une licence CC BY 4.0 Inist-CNRS / Unless otherwise stated above, the content of this bibliographic record may be used under a CC BY 4.0 licence by Inist-CNRS / A menos que se haya señalado antes, el contenido de este registro bibliográfico puede ser utilizado al amparo de una licencia CC BY 4.0 Inist-CNRS

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