Nickel pulse reversal plating for image reversal of ultrathin electron beam resist
- Autor
- AWAD, Yousef1 ; LAVALLEE, Eric1 ; BEAUVAIS, Jacques1 ; DROUIN, D1 ; LAU KIEN MUN1 ; PAN YANG1 ; CLOUTIER, M1 ; TURCOTTE, David1
[1] Quantiscript Inc., 2500 boulevard Universite, Sherbrooke, Quebec, J1K2R1, Canada - Fuente
Thin solid films. 2007, Vol 515, Num 5, pp 3040-3045, 6 p ; ref : 17 ref
- CODEN
- THSFAP
- ISSN
- 0040-6090
- Campo Científico
- Crystallography; Electronics; Metallurgy, welding; Condensed state physics
- Editor
- Elsevier Science, Lausanne
- País de la publicación
- Switzerland
- Tipo de documento
- Article
- Idioma
- English
- Palabra clave de autor
- Metallization Nickel Scanning electron microscopy Silicon deposition process Silver Surface defects Surface morphology
- Palabra clave (fr)
- Argent Cavité dans réseau Couche mince Défaut cristallin Défaut surface Dépôt électrolytique Etat surface Faisceau électron Fluor Formation motif Gravure ionique réactive Gravure plasma Grosseur grain Lithographie faisceau électron Microscopie électronique balayage Morphologie surface Métal transition Métallisation Nickel Rapport aspect Resist électronique Resist Silicium 5277B 6172Q 8115P Ni Si
- Palabra clave (in)
- Silver Voids Thin films Crystal defects Surface defect Electrodeposition Surface states Electron beams Fluorine Patterning Reactive ion etching Plasma etching Grain size Electron beam lithography Scanning electron microscopy Surface morphology Transition elements Metallizing Nickel Aspect ratio Electron resists Resists Silicon
- Palabra clave (es)
- Defecto superficie Grabado iónico reactivo Grabado plasma
- Clasificación
- Pascal
- 001 Exact sciences and technology / 001B Physics / 001B50 Physics of gases, plasmas and electric discharges / 001B50B Physics of plasmas and electric discharges / 001B50B77 Plasma applications / 001B50B77B Etching and cleaning
- Pascal
- 001 Exact sciences and technology / 001B Physics / 001B60 Condensed matter: structure, mechanical and thermal properties / 001B60A Structure of solids and liquids; crystallography / 001B60A72 Defects and impurities in crystals; microstructure / 001B60A72Q Microscopic defects (voids, inclusions, etc.)
- Pascal
- 001 Exact sciences and technology / 001B Physics / 001B80 Cross-disciplinary physics: materials science; rheology / 001B80A Materials science / 001B80A15 Methods of deposition of films and coatings; film growth and epitaxy / 001B80A15P Electrodeposition, electroplating
- Disciplina
- Physics and materials science Physics of condensed state : structure, mechanical and thermal properties Physics of gases, plasmas and electric discharges
- Procedencia
- Inist-CNRS
- Base de datos
- PASCAL
- Identificador INIST
- 18457212
Sauf mention contraire ci-dessus, le contenu de cette notice bibliographique peut être utilisé dans le cadre d’une licence CC BY 4.0 Inist-CNRS / Unless otherwise stated above, the content of this bibliographic record may be used under a CC BY 4.0 licence by Inist-CNRS / A menos que se haya señalado antes, el contenido de este registro bibliográfico puede ser utilizado al amparo de una licencia CC BY 4.0 Inist-CNRS
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DOI
10.1016/j.tsf.2006.08.016 
https://dx.doi.org/10.1016/j.tsf.2006.08.016
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