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Thin film coating technologies of (Ce,Gd)O2-δinterlayers for application in ceramic high-temperature fuel cells

Author
UHLENBRUCK, S1 ; JORDAN, N1 ; SEBOLD, D1 ; BUCHKREMER, H. P1 ; HAANAPPEL, V. A. C1 ; STÖVER, D1
[1] Forschungszentrum Jülich GmbH, Institute for Materials and Processes in Energy Systems, IWV, 52425 Jülich, Germany
Source

Thin solid films. 2007, Vol 515, Num 7-8, pp 4053-4060, 8 p ; ref : 17 ref

CODEN
THSFAP
ISSN
0040-6090
Scientific domain
Crystallography; Electronics; Metallurgy, welding; Condensed state physics
Publisher
Elsevier Science, Lausanne
Publication country
Switzerland
Document type
Article
Language
English
Author keyword
Ceramics Oxides Physical vapor deposition Solid oxide fuel cells
Keyword (fr)
Barrière diffusion Couche mince Cérium Diffusion(transport) Dépôt faisceau électronique Dépôt physique phase vapeur Electrolyte Gadolinium Hydrocarbure Impression Matériau électrode Pile combustible Revêtement diffusion Revêtement protecteur Réaction interface Strontium 8115C Sr
Keyword (en)
Diffusion barriers Thin films Cerium Diffusion Electron beam deposition Physical vapor deposition Electrolytes Gadolinium Hydrocarbons Printing Electrode material Fuel cells Diffusion coatings Protective coatings Interface reaction Strontium
Keyword (es)
Material electrodo Reacción interfase
Classification
Pascal
001 Exact sciences and technology / 001B Physics / 001B80 Cross-disciplinary physics: materials science; rheology / 001B80A Materials science / 001B80A15 Methods of deposition of films and coatings; film growth and epitaxy / 001B80A15C Deposition by sputtering

Discipline
Physics and materials science
Origin
Inist-CNRS
Database
PASCAL
INIST identifier
18534843

Sauf mention contraire ci-dessus, le contenu de cette notice bibliographique peut être utilisé dans le cadre d’une licence CC BY 4.0 Inist-CNRS / Unless otherwise stated above, the content of this bibliographic record may be used under a CC BY 4.0 licence by Inist-CNRS / A menos que se haya señalado antes, el contenido de este registro bibliográfico puede ser utilizado al amparo de una licencia CC BY 4.0 Inist-CNRS

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