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Comparison of femtosecond and nanosecond laser-induced damage in HfO2 single-layer film and HfO2-SiO2 high reflector

Author
LEI YUAN1 2 ; YUANAN ZHAO1 ; GUANGQIANG SHANG1 2 ; CHENGREN WANG1 2 ; HONGBO HE1 ; JIANDA SHAO1 ; ZHENGXIU FAN1
[1] Shanghai Institute of Optics and Fine Mechanics, Chinese Academy of Sciences, Shanghai 201800, China
[2] Graduate School of the Chinese Academy of Sciences, Beijing 100039, China
Source

Journal of the Optical Society of America. B, Optical physics (Print). 2007, Vol 24, Num 3, pp 538-543, 6 p ; ref : 23 ref

CODEN
JOBPDE
ISSN
0740-3224
Scientific domain
Optics
Publisher
Optical Society of America, Washington, DC
Publication country
United States
Document type
Article
Language
English
Keyword (fr)
Composé binaire Couche mince Domaine temps fs Domaine temps ns Détérioration par rayonnement Hafnium oxyde Irradiation laser Laser Multicouche Optique ultrarapide Réflecteur Silicium oxyde 4265R 4279F 4288 Hf O HfO2 O Si SiO2
Keyword (en)
Binary compounds Thin films fs range ns range Radiation damage Hafnium oxides Laser irradiation Lasers Multilayers Ultrafast optics Reflectors Silicon oxides
Keyword (es)
Deteriorización por irradiación Irradiación láser
Classification
Pascal
001 Exact sciences and technology / 001B Physics / 001B40 Fundamental areas of phenomenology (including applications) / 001B40B Optics / 001B40B65 Nonlinear optics / 001B40B65R Ultrafast processes; optical pulse generation and pulse compression

Pascal
001 Exact sciences and technology / 001B Physics / 001B40 Fundamental areas of phenomenology (including applications) / 001B40B Optics / 001B40B79 Optical elements, devices, and systems / 001B40B79F Reflectors, beam splitters, and deflectors

Pascal
001 Exact sciences and technology / 001B Physics / 001B40 Fundamental areas of phenomenology (including applications) / 001B40B Optics / 001B40B88 Radiation effects on optical elements, devices, and systems

Discipline
Physics : optics
Origin
Inist-CNRS
Database
PASCAL
INIST identifier
18574098

Sauf mention contraire ci-dessus, le contenu de cette notice bibliographique peut être utilisé dans le cadre d’une licence CC BY 4.0 Inist-CNRS / Unless otherwise stated above, the content of this bibliographic record may be used under a CC BY 4.0 licence by Inist-CNRS / A menos que se haya señalado antes, el contenido de este registro bibliográfico puede ser utilizado al amparo de una licencia CC BY 4.0 Inist-CNRS

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