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Conformational isomers of stilbene on Si(100)

Author
SCHMIDT, Philipp Martin1 ; HORN, Karsten1 ; DIL, J. Hugo1 ; KAMPEN, Thorsten U1
[1] Fritz-Haber-Institut der Max-Planck-Gesellschaft, Faradayweg 4-6, 14195 Berlin, Germany
Source

Surface science. 2007, Vol 601, Num 8, pp 1775-1780, 6 p ; ref : 28 ref

CODEN
SUSCAS
ISSN
0039-6028
Scientific domain
General chemistry, physical chemistry; Nanotechnologies, nanostructures, nanoobjects; Condensed state physics; Polymers, paint and wood industries
Publisher
Elsevier Science, Amsterdam / Elsevier Science, Lausanne / Elsevier Science, New York, NY
Publication country
Netherlands
Document type
Article
Language
English
Author keyword
Near edge extended X-ray absorption fine structure Silicon Stilbene Synchrotron radiation photoelectron spectroscopy
Keyword (fr)
Rayonnement synchrotron Silicium Spectre absorption RX Spectrométrie photoélectron Structure fine Si
Keyword (en)
Synchrotron radiation Silicon X-ray absorption spectra Photoelectron spectroscopy Fine structure
Classification
Pascal
001 Exact sciences and technology / 001B Physics / 001B60 Condensed matter: structure, mechanical and thermal properties

Pascal
001 Exact sciences and technology / 001B Physics / 001B70 Condensed matter: electronic structure, electrical, magnetic, and optical properties

Pascal
001 Exact sciences and technology / 001B Physics / 001B80 Cross-disciplinary physics: materials science; rheology

Discipline
Physics and materials science Physics of condensed state : electronic structure, electrical, magnetic and optical properties Physics of condensed state : structure, mechanical and thermal properties
Origin
Inist-CNRS
Database
PASCAL
INIST identifier
18677226

Sauf mention contraire ci-dessus, le contenu de cette notice bibliographique peut être utilisé dans le cadre d’une licence CC BY 4.0 Inist-CNRS / Unless otherwise stated above, the content of this bibliographic record may be used under a CC BY 4.0 licence by Inist-CNRS / A menos que se haya señalado antes, el contenido de este registro bibliográfico puede ser utilizado al amparo de una licencia CC BY 4.0 Inist-CNRS

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