Characteristics of self bias voltage and poly-Si etching in pulsed helicon wave plasma
- Author
- KIM, J.-H1 ; KANG, C.-J1 ; AHN, T.-H1 ; MOON, J.-T1
[1] Process Development 1, Semiconductor R&D center, Samsung Electronics, Kihueng, Yongin, Kyungki, Korea, Republic of - Conference title
- Papers presented at the joint symposium: The 11th Symposium on Plasma Science for Materials and the 4th Asia-Pacific Conference on Plasma Science & Technology, Coogee, Sydney, NSW, Australia, 27-29 July 1998
- Conference name
- Asia-Pacific Conference on Plasma Science & Technology (4 ; Coogee, Sydney 1998-07-27) = Symposium on Plasma Science for Materials (11 ; Coogee, Sydney 1998-07-27)
- Author (monograph)
- YOSHIDA, T (Editor)1 ; BOSWELL, R. W (Editor)2 ; KOINUMA, H (Editor)3 ; LOWKE, J. J (Editor)4
[1] The University of Tokyo, Japan
[2] Australia National University, Australia
[3] Tokyo Institute of Technology, Japan
[4] CSIRO, Australia - Source
Thin solid films. 1999, Vol 345, Num 1, pp 124-129 ; ref : 8 ref
- CODEN
- THSFAP
- ISSN
- 0040-6090
- Scientific domain
- Crystallography; Electronics; Metallurgy, welding; Condensed state physics
- Publisher
- Elsevier Science, Lausanne
- Publication country
- Switzerland
- Document type
- Conference Paper
- Language
- English
- Keyword (fr)
- Cinétique Etude expérimentale Gravure plasma Gravure sélective Matériau semiconducteur Onde hélicon Pastille électronique Polycristal Silicium Source impulsionnelle Tension polarisation Traitement surface Si Non métal
- Keyword (en)
- Kinetics Experimental study Plasma etching Selective etching Semiconductor materials Helicon waves Wafers Polycrystals Silicon Pulsed source Bias voltage Surface treatments Nonmetals
- Keyword (es)
- Grabado plasma Grabado selectivo Fuente impulsional Voltage polarización
- Classification
- Pascal
- 001 Exact sciences and technology / 001B Physics / 001B50 Physics of gases, plasmas and electric discharges / 001B50B Physics of plasmas and electric discharges / 001B50B77 Plasma applications
- Pascal
- 001 Exact sciences and technology / 001B Physics / 001B80 Cross-disciplinary physics: materials science; rheology / 001B80A Materials science / 001B80A65 Surface treatments
- Discipline
- Physics and materials science Physics of gases, plasmas and electric discharges
- Origin
- Inist-CNRS
- Database
- PASCAL
- INIST identifier
- 1870391
Sauf mention contraire ci-dessus, le contenu de cette notice bibliographique peut être utilisé dans le cadre d’une licence CC BY 4.0 Inist-CNRS / Unless otherwise stated above, the content of this bibliographic record may be used under a CC BY 4.0 licence by Inist-CNRS / A menos que se haya señalado antes, el contenido de este registro bibliográfico puede ser utilizado al amparo de una licencia CC BY 4.0 Inist-CNRS
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DOI
10.1016/S0040-6090(99)00108-X 
https://dx.doi.org/10.1016/S0040-6090(99)00108-X
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