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Initial oxidation of HF-acid treated Si(100) surfaces under air exposure studied by synchrotron radiation X-ray photoelectron spectroscopy

Author
HIROSE, F1 ; NAGATO, M1 ; KINOSHITA, Y1 ; NAGASE, S1 ; NARITA, Y2 ; SUEMITSU, M3
[1] Department of Electrical Engineering, Faculty of Engineering, Yamagata University, 4-3-16 Jonan, Yonezawa 992-8510, Japan
[2] Faculty of Engineering, Kyushu Institute of Technology, Japan
[3] Center for Interdisciplinary Research, Tohoku University, Japan
Source

Surface science. 2007, Vol 601, Num 11, pp 2302-2306, 5 p ; ref : 18 ref

CODEN
SUSCAS
ISSN
0039-6028
Scientific domain
General chemistry, physical chemistry; Nanotechnologies, nanostructures, nanoobjects; Condensed state physics; Polymers, paint and wood industries
Publisher
Elsevier Science, Amsterdam / Elsevier Science, Lausanne / Elsevier Science, New York, NY
Publication country
Netherlands
Document type
Article
Language
English
Author keyword
HF-acid Oxidation Si(100) Si Synchrotron radiation XPS
Keyword (fr)
Oxydation Rayonnement synchrotron Silicium Spectre photoélectron RX Si
Keyword (en)
Oxidation Synchrotron radiation Silicon X-ray photoelectron spectra
Classification
Pascal
001 Exact sciences and technology / 001B Physics / 001B60 Condensed matter: structure, mechanical and thermal properties

Pascal
001 Exact sciences and technology / 001B Physics / 001B70 Condensed matter: electronic structure, electrical, magnetic, and optical properties

Pascal
001 Exact sciences and technology / 001B Physics / 001B80 Cross-disciplinary physics: materials science; rheology

Discipline
Physics and materials science Physics of condensed state : electronic structure, electrical, magnetic and optical properties Physics of condensed state : structure, mechanical and thermal properties
Origin
Inist-CNRS
Database
PASCAL
INIST identifier
18790730

Sauf mention contraire ci-dessus, le contenu de cette notice bibliographique peut être utilisé dans le cadre d’une licence CC BY 4.0 Inist-CNRS / Unless otherwise stated above, the content of this bibliographic record may be used under a CC BY 4.0 licence by Inist-CNRS / A menos que se haya señalado antes, el contenido de este registro bibliográfico puede ser utilizado al amparo de una licencia CC BY 4.0 Inist-CNRS

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