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Reactions of atomic oxygen with the D-covered Si( 100) surfaces

Author
KHANOM, F1 ; KHAN, A. R1 ; RAHMAN, F1 ; TAKEO, A1 ; GOTO, H1 ; NAMIKI, A1
[1] Department of Electrical Engineering, Kyushu Institute of Technology, Kitakyushu 804-8550, Japan
Source

Surface science. 2007, Vol 601, Num 14, pp 2924-2930, 7 p ; ref : 26 ref

CODEN
SUSCAS
ISSN
0039-6028
Scientific domain
General chemistry, physical chemistry; Nanotechnologies, nanostructures, nanoobjects; Condensed state physics; Polymers, paint and wood industries
Publisher
Elsevier Science, Amsterdam / Elsevier Science, Lausanne / Elsevier Science, New York, NY
Publication country
Netherlands
Document type
Article
Language
English
Author keyword
Abstraction Deuterium adsorption Oxygen Silicon surface Water formation
Keyword (fr)
Eau Oxygène Silicium H O H2O O Si
Keyword (en)
Water Oxygen Silicon
Classification
Pascal
001 Exact sciences and technology / 001B Physics / 001B60 Condensed matter: structure, mechanical and thermal properties

Pascal
001 Exact sciences and technology / 001B Physics / 001B70 Condensed matter: electronic structure, electrical, magnetic, and optical properties

Pascal
001 Exact sciences and technology / 001B Physics / 001B80 Cross-disciplinary physics: materials science; rheology

Discipline
Physics and materials science Physics of condensed state : electronic structure, electrical, magnetic and optical properties Physics of condensed state : structure, mechanical and thermal properties
Origin
Inist-CNRS
Database
PASCAL
INIST identifier
18922445

Sauf mention contraire ci-dessus, le contenu de cette notice bibliographique peut être utilisé dans le cadre d’une licence CC BY 4.0 Inist-CNRS / Unless otherwise stated above, the content of this bibliographic record may be used under a CC BY 4.0 licence by Inist-CNRS / A menos que se haya señalado antes, el contenido de este registro bibliográfico puede ser utilizado al amparo de una licencia CC BY 4.0 Inist-CNRS

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