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Dielectric properties of KDP crystal damaged by laser beam

Author
GUTGALIS, Aurimas1 ; BANYS, Juras1 ; SIRUTKAITIS, Valdas1 ; GRIGALAITIS, Robertas1
[1] Faculty of Physics, Vilnius University, Sauletekio 9, 10222 Vilnius, Lithuania
Conference title
Advanced optical materials, technologies, and devices (27-30 August 2006, Vilnius, Lithuania)
Conference name
Advanced optical materials, technologies, and devices (2006)
Author (monograph)
Ašmontas, Steponas (Editor); Gradauskas, Jonas (Editor)
Puslaidininkių fizikos institutas, Lietuvos Mokslų akademija, Ussr (Organiser of meeting)
Society of Photo-optical Instrumentation Engineers, Baltic Chapter, Lithuania (Organiser of meeting)
Society of photo-optical instrumentation engineers, United States (Organiser of meeting)
Source

Proceedings of SPIE, the International Society for Optical Engineering. 2007 ; 1Vol, pp 65961M.1-65961M.4 ; ref : 9 ref

CODEN
PSISDG
ISSN
0277-786X
ISBN
978-0-8194-6732-4
Scientific domain
Electronics; Optics; Physics
Publisher
SPIE, Bellingham WA
Publication country
United States
Document type
Conference Paper
Language
English
Keyword (fr)
Composé quaternaire Constante diélectrique Domaine temps ns Faisceau laser Matériau diélectrique Matériau optique Méthode mesure Potassium dihydrogénophosphate 4270 K H O P KDP KH2PO4
Keyword (en)
Quaternary compounds Permittivity ns range Laser beams Dielectric materials Optical materials Measuring methods KDP
Classification
Pascal
001 Exact sciences and technology / 001B Physics / 001B40 Fundamental areas of phenomenology (including applications) / 001B40B Optics / 001B40B70 Optical materials

Discipline
Physics : optics
Origin
Inist-CNRS
Database
PASCAL
INIST identifier
18937410

Sauf mention contraire ci-dessus, le contenu de cette notice bibliographique peut être utilisé dans le cadre d’une licence CC BY 4.0 Inist-CNRS / Unless otherwise stated above, the content of this bibliographic record may be used under a CC BY 4.0 licence by Inist-CNRS / A menos que se haya señalado antes, el contenido de este registro bibliográfico puede ser utilizado al amparo de una licencia CC BY 4.0 Inist-CNRS

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