Dynamic shadow mask technique for device fabrication in UHV
- Author
- EGGER, Stefan1
[1] International Center for Young Scientists, National Institute for Materials Science, 1-1 Namiki, Tsukuba, Ibaraki 305-0044, Japan - Conference title
- Solar hydrogen and nanotechnology (14-17 August 2006)
- Conference name
- Solar hydrogen and nanotechnology. Conference (2006)
- Author (monograph)
- Vayssieres, Lionel (Editor)
Society of photo-optical instrumentation engineers, United States (Organiser of meeting) - Source
Proceedings of SPIE, the International Society for Optical Engineering. 2006 ; 1Vol, pp 63400Z.1-63400Z.6 ; ref : 11 ref
- CODEN
- PSISDG
- ISSN
- 0277-786X
- ISBN
- 0-8194-6419-8
- Scientific domain
- Electronics; Energy; Optics; Physics
- Publisher
- SPIE, Bellingham WA
- Publication country
- United States
- Document type
- Conference Paper
- Language
- English
- Keyword (fr)
- Contamination Dépôt sous vide Epaisseur Fabrication microélectronique Masque Nanostructure Nanotechnologie Semiconducteur Traitement surface Ultravide 8540H
- Keyword (en)
- Contamination Vacuum deposition Thickness Microelectronic fabrication Mask Nanostructure Nanotechnology Semiconductor materials Surface treatment Ultrahigh vacuum
- Keyword (es)
- Contaminación Depósito bajo vacío Espesor Fabricación microeléctrica Máscara Nanoestructura Nanotecnología Semiconductor(material) Tratamiento superficie Ultravacío
- Classification
- Pascal
- 001 Exact sciences and technology / 001D Applied sciences / 001D03 Electronics / 001D03F Semiconductor electronics. Microelectronics. Optoelectronics. Solid state devices / 001D03F17 Microelectronic fabrication (materials and surfaces technology)
- Discipline
- Electronics
- Origin
- Inist-CNRS
- Database
- PASCAL
- INIST identifier
- 18955596
Sauf mention contraire ci-dessus, le contenu de cette notice bibliographique peut être utilisé dans le cadre d’une licence CC BY 4.0 Inist-CNRS / Unless otherwise stated above, the content of this bibliographic record may be used under a CC BY 4.0 licence by Inist-CNRS / A menos que se haya señalado antes, el contenido de este registro bibliográfico puede ser utilizado al amparo de una licencia CC BY 4.0 Inist-CNRS
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