Enhancement of crystallization of Si films on quartz substrates by electric fields
- Author
- HORITA, S1 ; INAGAKI, D1 ; SATO, K1
[1] School of Materials Science, Japan Advanced Institute of Science and Technology, Hokuriku, 1-1 Asahidai, Tatsunokuchi, Ishikawa 923-1292, Japan - Conference title
- Proceedings of the Thin Films and Electronic Materials and Processing sessions from the 14th International Vacuum Congress, Birmingham, UK, 31 August-4 September, 1998
- Conference name
- IVC-14: International Vacuum Congress (14 ; Birmingham 1998-08-31)
- Author (monograph)
- HOWSON, R. P (Editor); PETTY, M (Editor)1 ; JACKMAN, R. B (Editor)2 ; YASUDA, Y (Editor)
British Vacuum Council, United Kingdom (Funder/Sponsor)
Institute of Physics, London, United Kingdom (Funder/Sponsor)
International Union for Vacuum Science, Technique and Applications, International (Funder/Sponsor)
[1] Loughborough Surface Analysis Ltd, United Kingdom
[2] University College of London, United Kingdom - Source
Thin solid films. 1999, Vol 343-4, pp 288-291 ; ref : 8 ref
- CODEN
- THSFAP
- ISSN
- 0040-6090
- Scientific domain
- Crystallography; Electronics; Metallurgy, welding; Condensed state physics
- Publisher
- Elsevier Science, Lausanne
- Publication country
- Switzerland
- Document type
- Conference Paper
- Language
- English
- Keyword (fr)
- Couche mince Cristallisation Croissance cristalline en phase vapeur Effet champ électrique Energie activation Epaisseur Etude expérimentale Evaporation faisceau électronique Matériau semiconducteur Polycristal Silicium Taille critique Si Non métal
- Keyword (en)
- Thin films Crystallization Crystal growth from vapors Electric field effects Activation energy Thickness Experimental study Electron beam evaporation Semiconductor materials Polycrystals Silicon Critical size Nonmetals
- Classification
- Pascal
- 001 Exact sciences and technology / 001B Physics / 001B80 Cross-disciplinary physics: materials science; rheology / 001B80A Materials science / 001B80A15 Methods of deposition of films and coatings; film growth and epitaxy / 001B80A15E Vacuum deposition
- Discipline
- Physics and materials science
- Origin
- Inist-CNRS
- Database
- PASCAL
- INIST identifier
- 1897066
Sauf mention contraire ci-dessus, le contenu de cette notice bibliographique peut être utilisé dans le cadre d’une licence CC BY 4.0 Inist-CNRS / Unless otherwise stated above, the content of this bibliographic record may be used under a CC BY 4.0 licence by Inist-CNRS / A menos que se haya señalado antes, el contenido de este registro bibliográfico puede ser utilizado al amparo de una licencia CC BY 4.0 Inist-CNRS
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DOI
10.1016/S0040-6090(98)01583-1 
https://dx.doi.org/10.1016/S0040-6090(98)01583-1
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