A new wastewater treatment technology for mixed acid drainage containing fluorine
- Author
- GOTO, A1 ; YAMASAKI, K1
[1] Integrated Circuit Group, Sharp Corporation, Fukuyama city, Hiroshisma 721-8522, Japan - Conference title
- International Symposium on Semiconductor Manufacturing (ISSM'98)
- Conference name
- International Symposium on Semiconductor Manufacturing (ISSM'98) (ISSM'98) (Tokyo 1998-10-07)
- Author (monograph)
- HATTORI, T (Editor); DOERING, R. R (Editor)
- Source
IEEE transactions on semiconductor manufacturing. 1999, Vol 12, Num 3, pp 295-301 ; ref : 10 ref
- ISSN
- 0894-6507
- Scientific domain
- Electronics
- Publisher
- Institute of Electrical and Electronics Engineers, New York, NY
- Publication country
- United States
- Document type
- Conference Paper
- Language
- English
- Keyword (fr)
- Acide Biochimie Bioréacteur Calcium carbonate Dégradation biologique Epuration eau usée Fabrication microélectronique Fluorine Industrie électronique Microorganisme Sédiment Traitement déchet
- Keyword (en)
- Acids Biochemistry Bioreactor Calcium carbonate Biodegradation Waste water purification Microelectronic fabrication Fluorite Electronics industry Microorganism Sediments Waste treatment
- Keyword (es)
- Acido Bioquímica Biorreactor Calcio carbonato Degradación biológica Depuración aguas servidas Fabricación microeléctrica Fluorina Industria electrónica Microorganismo Sedimento Tratamiento desperdicios
- Classification
- Pascal
- 001 Exact sciences and technology / 001D Applied sciences / 001D03 Electronics / 001D03A General (including economical and industrial fields)
- Discipline
- Electronics
- Origin
- Inist-CNRS
- Database
- PASCAL
- INIST identifier
- 1899028
Sauf mention contraire ci-dessus, le contenu de cette notice bibliographique peut être utilisé dans le cadre d’une licence CC BY 4.0 Inist-CNRS / Unless otherwise stated above, the content of this bibliographic record may be used under a CC BY 4.0 licence by Inist-CNRS / A menos que se haya señalado antes, el contenido de este registro bibliográfico puede ser utilizado al amparo de una licencia CC BY 4.0 Inist-CNRS
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DOI
10.1109/66.778194 
https://dx.doi.org/10.1109/66.778194
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