Integrated DFM framework for dynamic yield optimization
- Author
- PIKUS, Fedor G1
[1] Mentor Graphics, Inc, 8005 SW Boeckman Rd, Wilsonville, OR, 97070, United States - Conference title
- Photomask technology 2006 (19-22 September, 2006, Monterey, California, USA)
- Conference name
- Photomask technology (2006)
- Author (monograph)
- Martin, Patrick M (Editor); Naber, Robert J (Editor)
Society of photo-optical instrumentation engineers, United States (Organiser of meeting) - Source
Proceedings of SPIE, the International Society for Optical Engineering. 2006 ; 2Vol, pp 63490F.1-63490F.9 ; ref : 6 ref
- CODEN
- PSISDG
- ISSN
- 0277-786X
- ISBN
- 0-8194-6444-9
- Scientific domain
- Electronics; Optics; Physics
- Publisher
- SPIE, Bellingham, Washington
- Publication country
- United States
- Document type
- Conference Paper
- Language
- English
- Keyword (fr)
- Analyse circuit Analyse donnée Conception pour fabrication Défaillance Fabrication circuit intégré Gain Haute résolution Optimisation Procédé fabrication Correction optique de proximité
- Keyword (en)
- Network analysis Data analysis Design for manufacture Failures Integrated circuit manufacture Gain High resolution Optimization Manufacturing process Optical proximity correction
- Keyword (es)
- Análisis circuito Análisis datos Fallo Ganancia Alta resolucion Optimización Procedimiento fabricación Corrección de proximidad óptica
- Classification
- Pascal
- 001 Exact sciences and technology / 001D Applied sciences / 001D03 Electronics / 001D03F Semiconductor electronics. Microelectronics. Optoelectronics. Solid state devices / 001D03F06 Integrated circuits / 001D03F06A Design. Technologies. Operation analysis. Testing
- Pascal
- 001 Exact sciences and technology / 001D Applied sciences / 001D03 Electronics / 001D03G Electric, optical and optoelectronic circuits / 001D03G01 Theoretical study. Circuits analysis and design
- Discipline
- Electronics
- Origin
- Inist-CNRS
- Database
- PASCAL
- INIST identifier
- 19103994
Sauf mention contraire ci-dessus, le contenu de cette notice bibliographique peut être utilisé dans le cadre d’une licence CC BY 4.0 Inist-CNRS / Unless otherwise stated above, the content of this bibliographic record may be used under a CC BY 4.0 licence by Inist-CNRS / A menos que se haya señalado antes, el contenido de este registro bibliográfico puede ser utilizado al amparo de una licencia CC BY 4.0 Inist-CNRS
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