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Integrated DFM framework for dynamic yield optimization

Author
PIKUS, Fedor G1
[1] Mentor Graphics, Inc, 8005 SW Boeckman Rd, Wilsonville, OR, 97070, United States
Conference title
Photomask technology 2006 (19-22 September, 2006, Monterey, California, USA)
Conference name
Photomask technology (2006)
Author (monograph)
Martin, Patrick M (Editor); Naber, Robert J (Editor)
Society of photo-optical instrumentation engineers, United States (Organiser of meeting)
Source

Proceedings of SPIE, the International Society for Optical Engineering. 2006 ; 2Vol, pp 63490F.1-63490F.9 ; ref : 6 ref

CODEN
PSISDG
ISSN
0277-786X
ISBN
0-8194-6444-9
Scientific domain
Electronics; Optics; Physics
Publisher
SPIE, Bellingham, Washington
Publication country
United States
Document type
Conference Paper
Language
English
Keyword (fr)
Analyse circuit Analyse donnée Conception pour fabrication Défaillance Fabrication circuit intégré Gain Haute résolution Optimisation Procédé fabrication Correction optique de proximité
Keyword (en)
Network analysis Data analysis Design for manufacture Failures Integrated circuit manufacture Gain High resolution Optimization Manufacturing process Optical proximity correction
Keyword (es)
Análisis circuito Análisis datos Fallo Ganancia Alta resolucion Optimización Procedimiento fabricación Corrección de proximidad óptica
Classification
Pascal
001 Exact sciences and technology / 001D Applied sciences / 001D03 Electronics / 001D03F Semiconductor electronics. Microelectronics. Optoelectronics. Solid state devices / 001D03F06 Integrated circuits / 001D03F06A Design. Technologies. Operation analysis. Testing

Pascal
001 Exact sciences and technology / 001D Applied sciences / 001D03 Electronics / 001D03G Electric, optical and optoelectronic circuits / 001D03G01 Theoretical study. Circuits analysis and design

Discipline
Electronics
Origin
Inist-CNRS
Database
PASCAL
INIST identifier
19103994

Sauf mention contraire ci-dessus, le contenu de cette notice bibliographique peut être utilisé dans le cadre d’une licence CC BY 4.0 Inist-CNRS / Unless otherwise stated above, the content of this bibliographic record may be used under a CC BY 4.0 licence by Inist-CNRS / A menos que se haya señalado antes, el contenido de este registro bibliográfico puede ser utilizado al amparo de una licencia CC BY 4.0 Inist-CNRS

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