Application of DoseMapper for 65nm gate CD control : Strategies and results
- Author
- JEEWAKHAN, Nazneen1 ; SHAMMA, Nader1 ; CHOI, Sang-Jun1 ; ALVAREZ, Roque1
ASML San Jose, 235 Charcot Avenue, San Jose, CA 95131, United States
[1] Cypress Semiconductor, 195 Champion Court, San Jose, CA 95134, United States - Conference title
- Photomask technology 2006 (19-22 September, 2006, Monterey, California, USA)
- Conference name
- Photomask technology (2006)
- Author (monograph)
- Martin, Patrick M (Editor); Naber, Robert J (Editor)
Society of photo-optical instrumentation engineers, United States (Organiser of meeting) - Source
Proceedings of SPIE, the International Society for Optical Engineering. 2006 ; 2Vol, pp 63490G.1-63490G.11
- CODEN
- PSISDG
- ISSN
- 0277-786X
- ISBN
- 0-8194-6444-9
- Scientific domain
- Electronics; Optics; Physics
- Publisher
- SPIE, Bellingham, Washington
- Publication country
- United States
- Document type
- Conference Paper
- Language
- English
- Keyword (fr)
- Actionneur Caractéristique électrique Endommagement Evaluation performance Fabrication microélectronique Fonction erreur Largeur raie Lithographie Masque Miniaturisation Photolithographie Procédé fabrication Répartition spatiale Scanneur Taille critique
- Keyword (en)
- Actuator Electrical characteristic Damaging Performance evaluation Microelectronic fabrication Error function Line width Lithography Mask Miniaturization Photolithography Manufacturing process Spatial distribution Scanner Critical size
- Keyword (es)
- Accionador Característica eléctrica Deterioración Evaluación prestación Fabricación microeléctrica Función error Anchura raya espectral Litografía Máscara Miniaturización Fotolitografía Procedimiento fabricación Distribución espacial Escáner
- Classification
- Pascal
- 001 Exact sciences and technology / 001D Applied sciences / 001D02 Computer science; control theory; systems / 001D02D Control theory. Systems / 001D02D11 Robotics
- Pascal
- 001 Exact sciences and technology / 001D Applied sciences / 001D03 Electronics / 001D03F Semiconductor electronics. Microelectronics. Optoelectronics. Solid state devices / 001D03F16 Imaging devices
- Pascal
- 001 Exact sciences and technology / 001D Applied sciences / 001D03 Electronics / 001D03F Semiconductor electronics. Microelectronics. Optoelectronics. Solid state devices / 001D03F17 Microelectronic fabrication (materials and surfaces technology)
- Discipline
- Computer science : theoretical automation and systems Electronics
- Origin
- Inist-CNRS
- Database
- PASCAL
- INIST identifier
- 19103995
Sauf mention contraire ci-dessus, le contenu de cette notice bibliographique peut être utilisé dans le cadre d’une licence CC BY 4.0 Inist-CNRS / Unless otherwise stated above, the content of this bibliographic record may be used under a CC BY 4.0 licence by Inist-CNRS / A menos que se haya señalado antes, el contenido de este registro bibliográfico puede ser utilizado al amparo de una licencia CC BY 4.0 Inist-CNRS
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