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Application of DoseMapper for 65nm gate CD control : Strategies and results

Author
JEEWAKHAN, Nazneen1 ; SHAMMA, Nader1 ; CHOI, Sang-Jun1 ; ALVAREZ, Roque1
ASML San Jose, 235 Charcot Avenue, San Jose, CA 95131, United States
[1] Cypress Semiconductor, 195 Champion Court, San Jose, CA 95134, United States
Conference title
Photomask technology 2006 (19-22 September, 2006, Monterey, California, USA)
Conference name
Photomask technology (2006)
Author (monograph)
Martin, Patrick M (Editor); Naber, Robert J (Editor)
Society of photo-optical instrumentation engineers, United States (Organiser of meeting)
Source

Proceedings of SPIE, the International Society for Optical Engineering. 2006 ; 2Vol, pp 63490G.1-63490G.11

CODEN
PSISDG
ISSN
0277-786X
ISBN
0-8194-6444-9
Scientific domain
Electronics; Optics; Physics
Publisher
SPIE, Bellingham, Washington
Publication country
United States
Document type
Conference Paper
Language
English
Keyword (fr)
Actionneur Caractéristique électrique Endommagement Evaluation performance Fabrication microélectronique Fonction erreur Largeur raie Lithographie Masque Miniaturisation Photolithographie Procédé fabrication Répartition spatiale Scanneur Taille critique
Keyword (en)
Actuator Electrical characteristic Damaging Performance evaluation Microelectronic fabrication Error function Line width Lithography Mask Miniaturization Photolithography Manufacturing process Spatial distribution Scanner Critical size
Keyword (es)
Accionador Característica eléctrica Deterioración Evaluación prestación Fabricación microeléctrica Función error Anchura raya espectral Litografía Máscara Miniaturización Fotolitografía Procedimiento fabricación Distribución espacial Escáner
Classification
Pascal
001 Exact sciences and technology / 001D Applied sciences / 001D02 Computer science; control theory; systems / 001D02D Control theory. Systems / 001D02D11 Robotics

Pascal
001 Exact sciences and technology / 001D Applied sciences / 001D03 Electronics / 001D03F Semiconductor electronics. Microelectronics. Optoelectronics. Solid state devices / 001D03F16 Imaging devices

Pascal
001 Exact sciences and technology / 001D Applied sciences / 001D03 Electronics / 001D03F Semiconductor electronics. Microelectronics. Optoelectronics. Solid state devices / 001D03F17 Microelectronic fabrication (materials and surfaces technology)

Discipline
Computer science : theoretical automation and systems Electronics
Origin
Inist-CNRS
Database
PASCAL
INIST identifier
19103995

Sauf mention contraire ci-dessus, le contenu de cette notice bibliographique peut être utilisé dans le cadre d’une licence CC BY 4.0 Inist-CNRS / Unless otherwise stated above, the content of this bibliographic record may be used under a CC BY 4.0 licence by Inist-CNRS / A menos que se haya señalado antes, el contenido de este registro bibliográfico puede ser utilizado al amparo de una licencia CC BY 4.0 Inist-CNRS

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