Improved prediction of Across Chip Linewidth Variation (ACLV) with photomask aerial image CD metrology
- Author
- POORTINGA, Eric1 ; ZIBOLD, Axel2 ; CONLEY, Will3 ; LITT, Lloyd C3 ; KASPROIVICZ, Bryan4 ; CANGEMI, Michael4
[1] Carl Zeiss SMT Inc, Thomwood, NY, United States
[2] Carl Zeiss SMS GmbH, Jena, Germany
[3] Freescale Semiconductor Inc, Austin, Texas, United States
[4] Photronics, Inc, Allen, Texas, United States - Conference title
- Photomask technology 2006 (19-22 September, 2006, Monterey, California, USA)
- Conference name
- Photomask technology (2006)
- Author (monograph)
- Martin, Patrick M (Editor); Naber, Robert J (Editor)
Society of photo-optical instrumentation engineers, United States (Organiser of meeting) - Source
Proceedings of SPIE, the International Society for Optical Engineering. 2006 ; 2Vol, pp 63490N.1-63490N.7 ; ref : 8 ref
- CODEN
- PSISDG
- ISSN
- 0277-786X
- ISBN
- 0-8194-6444-9
- Scientific domain
- Electronics; Optics; Physics
- Publisher
- SPIE, Bellingham, Washington
- Publication country
- United States
- Document type
- Conference Paper
- Language
- English
- Keyword (fr)
- Caractéristique électrique Commande phase Etude comparative Evaluation performance Fabrication microélectronique Formation image Largeur raie Lithographie Logiciel Masque déphasage Microscopie électronique balayage Miniaturisation Méthode mesure Pastille électronique Photolithographie Propriété matériau Revêtement protecteur Résist Saisie donnée Scanneur Taille critique 0779
- Keyword (en)
- Electrical characteristic Phase control Comparative study Performance evaluation Microelectronic fabrication Imaging Line width Lithography Software Phase shifting masks Scanning electron microscopy Miniaturization Measurement method Wafer Photolithography Properties of materials Protective coatings Resist Data acquisition Scanner Critical size
- Keyword (es)
- Característica eléctrica Control fase Estudio comparativo Evaluación prestación Fabricación microeléctrica Formación imagen Anchura raya espectral Litografía Logicial Microscopía electrónica barrido Miniaturización Método medida Pastilla electrónica Fotolitografía Propiedad material Revestimiento protector Resistencia Toma dato Escáner
- Classification
- Pascal
- 001 Exact sciences and technology / 001B Physics / 001B00 General / 001B00G Instruments, apparatus, components and techniques common to several branches of physics and astronomy / 001B00G79 Scanning probe microscopes, components and techniques
- Pascal
- 001 Exact sciences and technology / 001D Applied sciences / 001D03 Electronics / 001D03C Materials
- Pascal
- 001 Exact sciences and technology / 001D Applied sciences / 001D03 Electronics / 001D03F Semiconductor electronics. Microelectronics. Optoelectronics. Solid state devices / 001D03F16 Imaging devices
- Pascal
- 001 Exact sciences and technology / 001D Applied sciences / 001D03 Electronics / 001D03F Semiconductor electronics. Microelectronics. Optoelectronics. Solid state devices / 001D03F17 Microelectronic fabrication (materials and surfaces technology)
- Discipline
- Electronics Metrology
- Origin
- Inist-CNRS
- Database
- PASCAL
- INIST identifier
- 19104002
Sauf mention contraire ci-dessus, le contenu de cette notice bibliographique peut être utilisé dans le cadre d’une licence CC BY 4.0 Inist-CNRS / Unless otherwise stated above, the content of this bibliographic record may be used under a CC BY 4.0 licence by Inist-CNRS / A menos que se haya señalado antes, el contenido de este registro bibliográfico puede ser utilizado al amparo de una licencia CC BY 4.0 Inist-CNRS
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