Limitations of optical reticle inspection for 45nm node and beyond
- Author
- TEUBER, S1 ; BZDUREK, A1 ; DÜRR, A. C1 ; HEUMANN, J1 ; HOLFELD, C1
[1] Advanced Mask Technology Center GmbH & Co. KG, Raehnitzer Allee 9, 01109 Dresden, Germany - Conference title
- Photomask technology 2006 (19-22 September, 2006, Monterey, California, USA)
- Conference name
- Photomask technology (2006)
- Author (monograph)
- Martin, Patrick M (Editor); Naber, Robert J (Editor)
Society of photo-optical instrumentation engineers, United States (Organiser of meeting) - Source
Proceedings of SPIE, the International Society for Optical Engineering. 2006 ; 2Vol, pp 63490T.1-63490T.10 ; ref : 3 ref
- CODEN
- PSISDG
- ISSN
- 0277-786X
- ISBN
- 0-8194-6444-9
- Scientific domain
- Electronics; Optics; Physics
- Publisher
- SPIE, Bellingham, Washington
- Publication country
- United States
- Document type
- Conference Paper
- Language
- English
- Keyword (fr)
- Caractérisation défaut Dimension défaut Etat actuel Fabrication microélectronique Masque Microscopie électronique balayage Miniaturisation Photolithographie Taille critique 0779 Correction optique de proximité Détection défaut
- Keyword (en)
- Defect characterization Defect size State of the art Microelectronic fabrication Mask Scanning electron microscopy Miniaturization Photolithography Critical size Optical proximity correction Defect detection
- Keyword (es)
- Caracterización defecto Dimensión imperfección Estado actual Fabricación microeléctrica Máscara Microscopía electrónica barrido Miniaturización Fotolitografía Corrección de proximidad óptica Detección imperfección
- Classification
- Pascal
- 001 Exact sciences and technology / 001B Physics / 001B00 General / 001B00G Instruments, apparatus, components and techniques common to several branches of physics and astronomy / 001B00G79 Scanning probe microscopes, components and techniques
- Pascal
- 001 Exact sciences and technology / 001D Applied sciences / 001D03 Electronics / 001D03B Testing, measurement, noise and reliability
- Pascal
- 001 Exact sciences and technology / 001D Applied sciences / 001D03 Electronics / 001D03F Semiconductor electronics. Microelectronics. Optoelectronics. Solid state devices / 001D03F17 Microelectronic fabrication (materials and surfaces technology)
- Discipline
- Electronics Metrology
- Origin
- Inist-CNRS
- Database
- PASCAL
- INIST identifier
- 19104007
Sauf mention contraire ci-dessus, le contenu de cette notice bibliographique peut être utilisé dans le cadre d’une licence CC BY 4.0 Inist-CNRS / Unless otherwise stated above, the content of this bibliographic record may be used under a CC BY 4.0 licence by Inist-CNRS / A menos que se haya señalado antes, el contenido de este registro bibliográfico puede ser utilizado al amparo de una licencia CC BY 4.0 Inist-CNRS
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