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Analysis of the vistec LMS IPRO3 performance and accuracy enhancement techniques

Author
ANTESBERGER, Gunter1 ; KNOTH, Sven1 ; LASKE, Frank1 ; RUDOLF, Jens1 ; COTTE, Eric1 ; ALLES, Benjamin2 ; BLÄSING, Carola3 ; FRICKE, Wolfgang3 ; RINN, Klaus4
[1] Advanced Mask Technology Center (AMTC), Rähnitzer Allee 9, 01109 Dresden, Germany
[2] TU München, M2, Lehrstuhl für Numerik. Boltzmannstr. 3, 85747 Garching, Germany
[3] Vistec Semiconductor Systems GmbH, Ernst-Leitz-Strasse 17-37, 35.578 Wetzlar, Germany
[4] Facimchhschule Giessen -Friedberg, Wiesenstr. 14, 35390 Giessen, Germany
Conference title
Photomask technology 2006 (19-22 September, 2006, Monterey, California, USA)
Conference name
Photomask technology (2006)
Author (monograph)
Martin, Patrick M (Editor); Naber, Robert J (Editor)
Society of photo-optical instrumentation engineers, United States (Organiser of meeting)
Source

Proceedings of SPIE, the International Society for Optical Engineering. 2006 ; 2Vol, pp 63491M.1-63491M.10 ; ref : 9 ref

CODEN
PSISDG
ISSN
0277-786X
ISBN
0-8194-6444-9
Scientific domain
Electronics; Optics; Physics
Publisher
SPIE, Bellingham, Washington
Publication country
United States
Document type
Conference Paper
Language
English
Keyword (fr)
Algorithme Erreur mesure Etude comparative Evaluation performance Logiciel Miniaturisation Méthode mesure Méthode moindre carré moyen Photolithographie Reproductibilité Répétabilité Système 2 dimensions
Keyword (en)
Algorithm Measurement error Comparative study Performance evaluation Software Miniaturization Measurement method Least mean squares methods Photolithography Reproducibility Repeatability Two dimensional system
Keyword (es)
Algoritmo Error medida Estudio comparativo Evaluación prestación Logicial Miniaturización Método medida Fotolitografía Reproductividad Repetibilidad Sistema 2 dimensiones
Classification
Pascal
001 Exact sciences and technology / 001D Applied sciences / 001D03 Electronics / 001D03F Semiconductor electronics. Microelectronics. Optoelectronics. Solid state devices / 001D03F17 Microelectronic fabrication (materials and surfaces technology)

Discipline
Electronics
Origin
Inist-CNRS
Database
PASCAL
INIST identifier
19104032

Sauf mention contraire ci-dessus, le contenu de cette notice bibliographique peut être utilisé dans le cadre d’une licence CC BY 4.0 Inist-CNRS / Unless otherwise stated above, the content of this bibliographic record may be used under a CC BY 4.0 licence by Inist-CNRS / A menos que se haya señalado antes, el contenido de este registro bibliográfico puede ser utilizado al amparo de una licencia CC BY 4.0 Inist-CNRS

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