Analysis of the vistec LMS IPRO3 performance and accuracy enhancement techniques
- Author
- ANTESBERGER, Gunter1 ; KNOTH, Sven1 ; LASKE, Frank1 ; RUDOLF, Jens1 ; COTTE, Eric1 ; ALLES, Benjamin2 ; BLÄSING, Carola3 ; FRICKE, Wolfgang3 ; RINN, Klaus4
[1] Advanced Mask Technology Center (AMTC), Rähnitzer Allee 9, 01109 Dresden, Germany
[2] TU München, M2, Lehrstuhl für Numerik. Boltzmannstr. 3, 85747 Garching, Germany
[3] Vistec Semiconductor Systems GmbH, Ernst-Leitz-Strasse 17-37, 35.578 Wetzlar, Germany
[4] Facimchhschule Giessen -Friedberg, Wiesenstr. 14, 35390 Giessen, Germany - Conference title
- Photomask technology 2006 (19-22 September, 2006, Monterey, California, USA)
- Conference name
- Photomask technology (2006)
- Author (monograph)
- Martin, Patrick M (Editor); Naber, Robert J (Editor)
Society of photo-optical instrumentation engineers, United States (Organiser of meeting) - Source
Proceedings of SPIE, the International Society for Optical Engineering. 2006 ; 2Vol, pp 63491M.1-63491M.10 ; ref : 9 ref
- CODEN
- PSISDG
- ISSN
- 0277-786X
- ISBN
- 0-8194-6444-9
- Scientific domain
- Electronics; Optics; Physics
- Publisher
- SPIE, Bellingham, Washington
- Publication country
- United States
- Document type
- Conference Paper
- Language
- English
- Keyword (fr)
- Algorithme Erreur mesure Etude comparative Evaluation performance Logiciel Miniaturisation Méthode mesure Méthode moindre carré moyen Photolithographie Reproductibilité Répétabilité Système 2 dimensions
- Keyword (en)
- Algorithm Measurement error Comparative study Performance evaluation Software Miniaturization Measurement method Least mean squares methods Photolithography Reproducibility Repeatability Two dimensional system
- Keyword (es)
- Algoritmo Error medida Estudio comparativo Evaluación prestación Logicial Miniaturización Método medida Fotolitografía Reproductividad Repetibilidad Sistema 2 dimensiones
- Classification
- Pascal
- 001 Exact sciences and technology / 001D Applied sciences / 001D03 Electronics / 001D03F Semiconductor electronics. Microelectronics. Optoelectronics. Solid state devices / 001D03F17 Microelectronic fabrication (materials and surfaces technology)
- Discipline
- Electronics
- Origin
- Inist-CNRS
- Database
- PASCAL
- INIST identifier
- 19104032
Sauf mention contraire ci-dessus, le contenu de cette notice bibliographique peut être utilisé dans le cadre d’une licence CC BY 4.0 Inist-CNRS / Unless otherwise stated above, the content of this bibliographic record may be used under a CC BY 4.0 licence by Inist-CNRS / A menos que se haya señalado antes, el contenido de este registro bibliográfico puede ser utilizado al amparo de una licencia CC BY 4.0 Inist-CNRS
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