CD measurement evaluation on periodic patterns between optic tools and CD-SEM
- Author
- CHOI, Yongkyoo1 ; KIM, Munsik1 ; OH, Sunghyun1 ; HAN, Oscar1
[1] Mask Development, R&D Division, Hynix Semiconductor, Cheongju-si, 361-725, Korea, Republic of - Conference title
- Photomask technology 2006 (19-22 September, 2006, Monterey, California, USA)
- Conference name
- Photomask technology (2006)
- Author (monograph)
- Martin, Patrick M (Editor); Naber, Robert J (Editor)
Society of photo-optical instrumentation engineers, United States (Organiser of meeting) - Source
Proceedings of SPIE, the International Society for Optical Engineering. 2006 ; 2Vol, pp 63491N.1-63491N.8 ; ref : 2 ref
- CODEN
- PSISDG
- ISSN
- 0277-786X
- ISBN
- 0-8194-6444-9
- Scientific domain
- Electronics; Optics; Physics
- Publisher
- SPIE, Bellingham, Washington
- Publication country
- United States
- Document type
- Conference Paper
- Language
- English
- Keyword (fr)
- Circuit intégré Couche active Ellipsométrie spectroscopique Facteur transmission Fonction erreur Haute résolution Lumière réfléchie Masque Mesure optique Microscopie électronique balayage Mémoire accès direct dynamique Mémoire accès direct Méthode mesure Méthode optique Pastille électronique Précision mesure Rayonnement UV extrême Taille critique Transformation Fourier rapide 0779
- Keyword (en)
- Integrated circuit Active layer Spectroscopic ellipsometry Transmittance Error function High resolution Reflected light Mask Optical measurement Scanning electron microscopy Dynamic random access memory Random access memory Measurement method Optical method Wafer Measurement accuracy Vacuum ultraviolet radiation Critical size Fast Fourier transformation
- Keyword (es)
- Circuito integrado Capa activa Elipsometría espectroscópica Factor transmisión Función error Alta resolucion Luz reflejada Máscara Medida óptica Microscopía electrónica barrido Memoria acceso directo Método medida Método óptico Pastilla electrónica Precisión medida Radiación ultravioleta extrema Transformación Fourier rápida
- Classification
- Pascal
- 001 Exact sciences and technology / 001B Physics / 001B00 General / 001B00G Instruments, apparatus, components and techniques common to several branches of physics and astronomy / 001B00G79 Scanning probe microscopes, components and techniques
- Pascal
- 001 Exact sciences and technology / 001D Applied sciences / 001D03 Electronics / 001D03F Semiconductor electronics. Microelectronics. Optoelectronics. Solid state devices / 001D03F06 Integrated circuits / 001D03F06A Design. Technologies. Operation analysis. Testing
- Pascal
- 001 Exact sciences and technology / 001D Applied sciences / 001D03 Electronics / 001D03F Semiconductor electronics. Microelectronics. Optoelectronics. Solid state devices / 001D03F06 Integrated circuits / 001D03F06B Integrated circuits by function (including memories and processors)
- Discipline
- Electronics Metrology
- Origin
- Inist-CNRS
- Database
- PASCAL
- INIST identifier
- 19104033
Sauf mention contraire ci-dessus, le contenu de cette notice bibliographique peut être utilisé dans le cadre d’une licence CC BY 4.0 Inist-CNRS / Unless otherwise stated above, the content of this bibliographic record may be used under a CC BY 4.0 licence by Inist-CNRS / A menos que se haya señalado antes, el contenido de este registro bibliográfico puede ser utilizado al amparo de una licencia CC BY 4.0 Inist-CNRS
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