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Point cleaning of mask blanks for extreme ultraviolet lithography

Author
BROWN, Mike1 ; HARTLEY, John1 ; EICHENLAUB, Sean2 ; RASTEGAR, Abbas2 ; MARMILLION, Patricia2 ; ROESSLER, Ken3
[1] College of Nanoscale Science and Engineering, UAlbany, Albany, New York, 12203, United States
[2] SEMATECH Mask Blank Development Center, Albany, New York, 12203, United States
[3] RAVE LLC, Delray Beach, Florida, 33445, United States
Conference title
Photomask technology 2006 (19-22 September, 2006, Monterey, California, USA)
Conference name
Photomask technology (2006)
Author (monograph)
Martin, Patrick M (Editor); Naber, Robert J (Editor)
Society of photo-optical instrumentation engineers, United States (Organiser of meeting)
Source

Proceedings of SPIE, the International Society for Optical Engineering. 2006 ; 2Vol, pp 63492K.1-63492K.9 ; ref : 6 ref

CODEN
PSISDG
ISSN
0277-786X
ISBN
0-8194-6444-9
Scientific domain
Electronics; Optics; Physics
Publisher
SPIE, Bellingham, Washington
Publication country
United States
Document type
Conference Paper
Language
English
Keyword (fr)
Fabrication microélectronique Fréquence spatiale Haute fréquence Lithographie UV Masque Microscopie force atomique Microusinage Nettoyage Optimisation Photolithographie Rayonnement UV extrême Rugosité Résist
Keyword (en)
Microelectronic fabrication Spatial frequency High frequency UV lithography Mask Atomic force microscopy Micromachining Cleaning Optimization Photolithography Vacuum ultraviolet radiation Roughness Resist
Keyword (es)
Fabricación microeléctrica Frecuencia espacial Alta frecuencia Litografía UV Máscara Microscopía fuerza atómica Micromaquinado Limpieza Optimización Fotolitografía Radiación ultravioleta extrema Rugosidad Resistencia
Classification
Pascal
001 Exact sciences and technology / 001D Applied sciences / 001D03 Electronics / 001D03F Semiconductor electronics. Microelectronics. Optoelectronics. Solid state devices / 001D03F17 Microelectronic fabrication (materials and surfaces technology)

Discipline
Electronics
Origin
Inist-CNRS
Database
PASCAL
INIST identifier
19104064

Sauf mention contraire ci-dessus, le contenu de cette notice bibliographique peut être utilisé dans le cadre d’une licence CC BY 4.0 Inist-CNRS / Unless otherwise stated above, the content of this bibliographic record may be used under a CC BY 4.0 licence by Inist-CNRS / A menos que se haya señalado antes, el contenido de este registro bibliográfico puede ser utilizado al amparo de una licencia CC BY 4.0 Inist-CNRS

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