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EUV mask pattern inspection for memory mask fabrication in 45 nm node and below

Author
DO YOUNG KIM1 ; SEONG YONG CHO1 ; EUN JI KIM2 ; ZHENGYU GUO2 ; QUACH, Ellen2 ; GEE, David2 ; BROWN, Tom2 ; DAYAL, Aditya2 ; KIM, Hun1 ; SUNG MIN HUH1 ; DONG HOON CHUNG1 ; BYUNG CHUL CHA1 ; JUNG WOO LEE1 ; SEONG WOON CHOI1 ; WOO SUNG HAN1 ; KI HUN PARK2
[1] Photomask team, Samsung electronics. Co. Ltd. San #24 Nongseo-Ri, Giheung-Eup, Yongin-City, Gyeonggi-Do, 449-711, Korea, Republic of
[2] KLA-Tencor, 160 Rio Robles, San Jose, CA 95134, United States
Conference title
Photomask technology 2006 (19-22 September, 2006, Monterey, California, USA)
Conference name
Photomask technology (2006)
Author (monograph)
Martin, Patrick M (Editor); Naber, Robert J (Editor)
Society of photo-optical instrumentation engineers, United States (Organiser of meeting)
Source

Proceedings of SPIE, the International Society for Optical Engineering. 2006 ; 2Vol, pp 63492L.1-63492L.10 ; ref : 4 ref

CODEN
PSISDG
ISSN
0277-786X
ISBN
0-8194-6444-9
Scientific domain
Electronics; Optics; Physics
Publisher
SPIE, Bellingham, Washington
Publication country
United States
Document type
Conference Paper
Language
English
Keyword (fr)
Détection défaut Fabrication microélectronique Lithographie UV Masque Miniaturisation Méthode immersion Photolithographie Rayonnement UV extrême
Keyword (en)
Defect detection Microelectronic fabrication UV lithography Mask Miniaturization Immersion method Photolithography Vacuum ultraviolet radiation
Keyword (es)
Detección imperfección Fabricación microeléctrica Litografía UV Máscara Miniaturización Método immersión Fotolitografía Radiación ultravioleta extrema
Classification
Pascal
001 Exact sciences and technology / 001D Applied sciences / 001D03 Electronics / 001D03B Testing, measurement, noise and reliability

Pascal
001 Exact sciences and technology / 001D Applied sciences / 001D03 Electronics / 001D03F Semiconductor electronics. Microelectronics. Optoelectronics. Solid state devices / 001D03F17 Microelectronic fabrication (materials and surfaces technology)

Discipline
Electronics
Origin
Inist-CNRS
Database
PASCAL
INIST identifier
19104065

Sauf mention contraire ci-dessus, le contenu de cette notice bibliographique peut être utilisé dans le cadre d’une licence CC BY 4.0 Inist-CNRS / Unless otherwise stated above, the content of this bibliographic record may be used under a CC BY 4.0 licence by Inist-CNRS / A menos que se haya señalado antes, el contenido de este registro bibliográfico puede ser utilizado al amparo de una licencia CC BY 4.0 Inist-CNRS

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