Novel cleaning techniques to achieve defect-free photomasks for sub-65nm nodes
- Author
- JIN HO RYU1 ; DONG WOOK LEE1 ; JI SUN RYU1 ; SANG PYO KIM1 ; HAN, Oscar1
[1] R&D Division, Hynix Semiconductor Inc. 1 Hyangjeong-dong, Hungduck-gu Cheongju-si 361-725, Korea, Republic of - Conference title
- Photomask technology 2006 (19-22 September, 2006, Monterey, California, USA)
- Conference name
- Photomask technology (2006)
- Author (monograph)
- Martin, Patrick M (Editor); Naber, Robert J (Editor)
Society of photo-optical instrumentation engineers, United States (Organiser of meeting) - Source
Proceedings of SPIE, the International Society for Optical Engineering. 2006 ; 2Vol, pp 63492V.1-63492V.11 ; ref : 7 ref
- CODEN
- PSISDG
- ISSN
- 0277-786X
- ISBN
- 0-8194-6444-9
- Scientific domain
- Electronics; Optics; Physics
- Publisher
- SPIE, Bellingham, Washington
- Publication country
- United States
- Document type
- Conference Paper
- Language
- English
- Keyword (fr)
- Convertisseur AN Endommagement Fabrication microélectronique Générateur forme Industrie électronique Masque Mesure phase Miniaturisation Nettoyage chimique Ozonation Photolithographie Photorésist Procédé voie sèche Production masse Rayonnement UV extrême Système intelligent
- Keyword (en)
- AD converter Damaging Microelectronic fabrication Pattern generator Electronics industry Mask Phase measurement Miniaturization Chemical cleaning Ozonization Photolithography Photoresist Dry process Mass production Vacuum ultraviolet radiation Intelligent system
- Keyword (es)
- Convertidor AN Deterioración Fabricación microeléctrica Generador forma Industria electrónica Máscara Medida fase Miniaturización Limpieza química Ozonización Fotolitografía Fotorresistencia Procedimiento vía seca Producción en masa Radiación ultravioleta extrema Sistema inteligente
- Classification
- Pascal
- 001 Exact sciences and technology / 001D Applied sciences / 001D03 Electronics / 001D03A General (including economical and industrial fields)
- Pascal
- 001 Exact sciences and technology / 001D Applied sciences / 001D03 Electronics / 001D03F Semiconductor electronics. Microelectronics. Optoelectronics. Solid state devices / 001D03F17 Microelectronic fabrication (materials and surfaces technology)
- Pascal
- 001 Exact sciences and technology / 001D Applied sciences / 001D03 Electronics / 001D03G Electric, optical and optoelectronic circuits / 001D03G02 Circuit properties / 001D03G02A Electronic circuits / 001D03G02A4 Signal convertors
- Discipline
- Electronics
- Origin
- Inist-CNRS
- Database
- PASCAL
- INIST identifier
- 19104074
Sauf mention contraire ci-dessus, le contenu de cette notice bibliographique peut être utilisé dans le cadre d’une licence CC BY 4.0 Inist-CNRS / Unless otherwise stated above, the content of this bibliographic record may be used under a CC BY 4.0 licence by Inist-CNRS / A menos que se haya señalado antes, el contenido de este registro bibliográfico puede ser utilizado al amparo de una licencia CC BY 4.0 Inist-CNRS
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