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Process development for EUV mask production

Author
ABE, Tsukasa1 ; FUJII, Akiko1 ; SASAKI, Shiho1 ; MOHRI, Hiroshi1 ; HAYASHI, Naoya1 ; SHOKI, Tsutomu2 ; YAMADA, Takeyuki3 ; NOZAWA, Osamu2 ; OHKUBO, Ryo2 ; USHIDA, Masao3
[1] Electronic Device Operations, Dai Nippon Printing Co.,Ltd. 2-2-1, Fukuoka, Fujimino-shi, Saitama 356-8507, Japan
[2] NGL Development Center, HOYA Corporation 3-3-1 Musashino, Akishima-shi, Tokyo 196-8510, Japan
[3] Blanks Division, HOYA Corporation 3280 Nakamaru, Nagasaka, Hokuto-shi, Yamanashi 408-8550, Japan
Conference title
Photomask technology 2006 (19-22 September, 2006, Monterey, California, USA)
Conference name
Photomask technology (2006)
Author (monograph)
Martin, Patrick M (Editor); Naber, Robert J (Editor)
Society of photo-optical instrumentation engineers, United States (Organiser of meeting)
Source

Proceedings of SPIE, the International Society for Optical Engineering. 2006 ; 2Vol, pp 63493G.1-63493G.7 ; ref : 3 ref

CODEN
PSISDG
ISSN
0277-786X
ISBN
0-8194-6444-9
Scientific domain
Electronics; Optics; Physics
Publisher
SPIE, Bellingham, Washington
Publication country
United States
Document type
Conference Paper
Language
English
Keyword (fr)
Couche tampon Endommagement Fabrication microélectronique Facteur réflexion Gravure sèche Haute résolution Lithographie UV Masque Microscopie force atomique Microusinage Photolithographie Procédé voie sèche Rayonnement UV extrême Résist Taille critique
Keyword (en)
Buffer layer Damaging Microelectronic fabrication Reflectance Dry etching High resolution UV lithography Mask Atomic force microscopy Micromachining Photolithography Dry process Vacuum ultraviolet radiation Resist Critical size
Keyword (es)
Capa tampón Deterioración Fabricación microeléctrica Coeficiente reflexión Grabado seco Alta resolucion Litografía UV Máscara Microscopía fuerza atómica Micromaquinado Fotolitografía Procedimiento vía seca Radiación ultravioleta extrema Resistencia
Classification
Pascal
001 Exact sciences and technology / 001D Applied sciences / 001D03 Electronics / 001D03F Semiconductor electronics. Microelectronics. Optoelectronics. Solid state devices / 001D03F17 Microelectronic fabrication (materials and surfaces technology)

Discipline
Electronics
Origin
Inist-CNRS
Database
PASCAL
INIST identifier
19104092

Sauf mention contraire ci-dessus, le contenu de cette notice bibliographique peut être utilisé dans le cadre d’une licence CC BY 4.0 Inist-CNRS / Unless otherwise stated above, the content of this bibliographic record may be used under a CC BY 4.0 licence by Inist-CNRS / A menos que se haya señalado antes, el contenido de este registro bibliográfico puede ser utilizado al amparo de una licencia CC BY 4.0 Inist-CNRS

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