Process development for EUV mask production
- Author
- ABE, Tsukasa1 ; FUJII, Akiko1 ; SASAKI, Shiho1 ; MOHRI, Hiroshi1 ; HAYASHI, Naoya1 ; SHOKI, Tsutomu2 ; YAMADA, Takeyuki3 ; NOZAWA, Osamu2 ; OHKUBO, Ryo2 ; USHIDA, Masao3
[1] Electronic Device Operations, Dai Nippon Printing Co.,Ltd. 2-2-1, Fukuoka, Fujimino-shi, Saitama 356-8507, Japan
[2] NGL Development Center, HOYA Corporation 3-3-1 Musashino, Akishima-shi, Tokyo 196-8510, Japan
[3] Blanks Division, HOYA Corporation 3280 Nakamaru, Nagasaka, Hokuto-shi, Yamanashi 408-8550, Japan - Conference title
- Photomask technology 2006 (19-22 September, 2006, Monterey, California, USA)
- Conference name
- Photomask technology (2006)
- Author (monograph)
- Martin, Patrick M (Editor); Naber, Robert J (Editor)
Society of photo-optical instrumentation engineers, United States (Organiser of meeting) - Source
Proceedings of SPIE, the International Society for Optical Engineering. 2006 ; 2Vol, pp 63493G.1-63493G.7 ; ref : 3 ref
- CODEN
- PSISDG
- ISSN
- 0277-786X
- ISBN
- 0-8194-6444-9
- Scientific domain
- Electronics; Optics; Physics
- Publisher
- SPIE, Bellingham, Washington
- Publication country
- United States
- Document type
- Conference Paper
- Language
- English
- Keyword (fr)
- Couche tampon Endommagement Fabrication microélectronique Facteur réflexion Gravure sèche Haute résolution Lithographie UV Masque Microscopie force atomique Microusinage Photolithographie Procédé voie sèche Rayonnement UV extrême Résist Taille critique
- Keyword (en)
- Buffer layer Damaging Microelectronic fabrication Reflectance Dry etching High resolution UV lithography Mask Atomic force microscopy Micromachining Photolithography Dry process Vacuum ultraviolet radiation Resist Critical size
- Keyword (es)
- Capa tampón Deterioración Fabricación microeléctrica Coeficiente reflexión Grabado seco Alta resolucion Litografía UV Máscara Microscopía fuerza atómica Micromaquinado Fotolitografía Procedimiento vía seca Radiación ultravioleta extrema Resistencia
- Classification
- Pascal
- 001 Exact sciences and technology / 001D Applied sciences / 001D03 Electronics / 001D03F Semiconductor electronics. Microelectronics. Optoelectronics. Solid state devices / 001D03F17 Microelectronic fabrication (materials and surfaces technology)
- Discipline
- Electronics
- Origin
- Inist-CNRS
- Database
- PASCAL
- INIST identifier
- 19104092
Sauf mention contraire ci-dessus, le contenu de cette notice bibliographique peut être utilisé dans le cadre d’une licence CC BY 4.0 Inist-CNRS / Unless otherwise stated above, the content of this bibliographic record may be used under a CC BY 4.0 licence by Inist-CNRS / A menos que se haya señalado antes, el contenido de este registro bibliográfico puede ser utilizado al amparo de una licencia CC BY 4.0 Inist-CNRS
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