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CP mask optimization for enhancing the throughput of MCC systems

Author
SUGIHARA, Makoto1 ; NAKAMURA, Kenta2 ; MATSUNAGA, Yusuke2 ; MURAKAMI, Kazuaki2
[1] ISIT, 2-1-22 Momochihama, Sawara-ku, Fukuoka-shi 814-0001, Japan
[2] Kyushu University, 6-1 Kasuga-Koen, Kasuga, Fukuoka-shi 816-8580, Japan
Conference title
Photomask technology 2006 (19-22 September, 2006, Monterey, California, USA)
Conference name
Photomask technology (2006)
Author (monograph)
Martin, Patrick M (Editor); Naber, Robert J (Editor)
Society of photo-optical instrumentation engineers, United States (Organiser of meeting)
Source

Proceedings of SPIE, the International Society for Optical Engineering. 2006 ; 2Vol, pp 63494B.1-63494B.12 ; ref : 21 ref

CODEN
PSISDG
ISSN
0277-786X
ISBN
0-8194-6444-9
Scientific domain
Electronics; Optics; Physics
Publisher
SPIE, Bellingham, Washington
Publication country
United States
Document type
Conference Paper
Language
English
Keyword (fr)
Fabrication microélectronique Masque Modèle non linéaire Optimisation Photolithographie Programmation partiellement en nombres entiers Lithographie sans masque
Keyword (en)
Microelectronic fabrication Mask Non linear model Optimization Photolithography Mixed integer programming Maskless lithography
Keyword (es)
Fabricación microeléctrica Máscara Modelo no lineal Optimización Fotolitografía Programación mixta entera Litografía sin máscara
Classification
Pascal
001 Exact sciences and technology / 001D Applied sciences / 001D03 Electronics / 001D03F Semiconductor electronics. Microelectronics. Optoelectronics. Solid state devices / 001D03F17 Microelectronic fabrication (materials and surfaces technology)

Discipline
Electronics
Origin
Inist-CNRS
Database
PASCAL
INIST identifier
19104119

Sauf mention contraire ci-dessus, le contenu de cette notice bibliographique peut être utilisé dans le cadre d’une licence CC BY 4.0 Inist-CNRS / Unless otherwise stated above, the content of this bibliographic record may be used under a CC BY 4.0 licence by Inist-CNRS / A menos que se haya señalado antes, el contenido de este registro bibliográfico puede ser utilizado al amparo de una licencia CC BY 4.0 Inist-CNRS

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