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Evaluation of writing strategy with one and two pass on OPC technology using EBM writing system

Author
TSENG, Chen-Rui1 ; CHENG, Kevin1 ; LEE, David1 ; YANG, Sheng-Bay1 ; WU, Chun-Hung1
[1] Taiwan Mask Corporation, Hsinchu, Taiwan, Province of China
Conference title
Photomask technology 2006 (19-22 September, 2006, Monterey, California, USA)
Conference name
Photomask technology (2006)
Author (monograph)
Martin, Patrick M (Editor); Naber, Robert J (Editor)
Society of photo-optical instrumentation engineers, United States (Organiser of meeting)
Source

Proceedings of SPIE, the International Society for Optical Engineering. 2006 ; 2Vol, pp 63494C.1-63494C.10 ; ref : 4 ref

CODEN
PSISDG
ISSN
0277-786X
ISBN
0-8194-6444-9
Scientific domain
Electronics; Optics; Physics
Publisher
SPIE, Bellingham, Washington
Publication country
United States
Document type
Conference Paper
Language
English
Keyword (fr)
Evaluation performance Fabrication microélectronique Lithographie faisceau électron Microscopie électronique balayage Parallélisme Rugosité Taille critique 0779 Correction optique de proximité
Keyword (en)
Performance evaluation Microelectronic fabrication Electron beam lithography Scanning electron microscopy Parallelism Roughness Critical size Optical proximity correction
Keyword (es)
Evaluación prestación Fabricación microeléctrica Litografía haz electrón Microscopía electrónica barrido Paralelismo Rugosidad Corrección de proximidad óptica
Classification
Pascal
001 Exact sciences and technology / 001B Physics / 001B00 General / 001B00G Instruments, apparatus, components and techniques common to several branches of physics and astronomy / 001B00G79 Scanning probe microscopes, components and techniques

Pascal
001 Exact sciences and technology / 001D Applied sciences / 001D03 Electronics / 001D03F Semiconductor electronics. Microelectronics. Optoelectronics. Solid state devices / 001D03F17 Microelectronic fabrication (materials and surfaces technology)

Discipline
Electronics Metrology
Origin
Inist-CNRS
Database
PASCAL
INIST identifier
19104120

Sauf mention contraire ci-dessus, le contenu de cette notice bibliographique peut être utilisé dans le cadre d’une licence CC BY 4.0 Inist-CNRS / Unless otherwise stated above, the content of this bibliographic record may be used under a CC BY 4.0 licence by Inist-CNRS / A menos que se haya señalado antes, el contenido de este registro bibliográfico puede ser utilizado al amparo de una licencia CC BY 4.0 Inist-CNRS

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