Evaluation of writing strategy with one and two pass on OPC technology using EBM writing system
- Author
- TSENG, Chen-Rui1 ; CHENG, Kevin1 ; LEE, David1 ; YANG, Sheng-Bay1 ; WU, Chun-Hung1
[1] Taiwan Mask Corporation, Hsinchu, Taiwan, Province of China - Conference title
- Photomask technology 2006 (19-22 September, 2006, Monterey, California, USA)
- Conference name
- Photomask technology (2006)
- Author (monograph)
- Martin, Patrick M (Editor); Naber, Robert J (Editor)
Society of photo-optical instrumentation engineers, United States (Organiser of meeting) - Source
Proceedings of SPIE, the International Society for Optical Engineering. 2006 ; 2Vol, pp 63494C.1-63494C.10 ; ref : 4 ref
- CODEN
- PSISDG
- ISSN
- 0277-786X
- ISBN
- 0-8194-6444-9
- Scientific domain
- Electronics; Optics; Physics
- Publisher
- SPIE, Bellingham, Washington
- Publication country
- United States
- Document type
- Conference Paper
- Language
- English
- Keyword (fr)
- Evaluation performance Fabrication microélectronique Lithographie faisceau électron Microscopie électronique balayage Parallélisme Rugosité Taille critique 0779 Correction optique de proximité
- Keyword (en)
- Performance evaluation Microelectronic fabrication Electron beam lithography Scanning electron microscopy Parallelism Roughness Critical size Optical proximity correction
- Keyword (es)
- Evaluación prestación Fabricación microeléctrica Litografía haz electrón Microscopía electrónica barrido Paralelismo Rugosidad Corrección de proximidad óptica
- Classification
- Pascal
- 001 Exact sciences and technology / 001B Physics / 001B00 General / 001B00G Instruments, apparatus, components and techniques common to several branches of physics and astronomy / 001B00G79 Scanning probe microscopes, components and techniques
- Pascal
- 001 Exact sciences and technology / 001D Applied sciences / 001D03 Electronics / 001D03F Semiconductor electronics. Microelectronics. Optoelectronics. Solid state devices / 001D03F17 Microelectronic fabrication (materials and surfaces technology)
- Discipline
- Electronics Metrology
- Origin
- Inist-CNRS
- Database
- PASCAL
- INIST identifier
- 19104120
Sauf mention contraire ci-dessus, le contenu de cette notice bibliographique peut être utilisé dans le cadre d’une licence CC BY 4.0 Inist-CNRS / Unless otherwise stated above, the content of this bibliographic record may be used under a CC BY 4.0 licence by Inist-CNRS / A menos que se haya señalado antes, el contenido de este registro bibliográfico puede ser utilizado al amparo de una licencia CC BY 4.0 Inist-CNRS
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