More evolved PGSD (Proximity Gap Suction Developer) for controlling movement of dissolution products
- Author
- SAKURAI, Hideaki1 ; OPPATA, Yukio1 ; KAMEI, Shigenori2 ; HAYASHI, Naoya3 ; MURANO, Koji1 ; SAKAI, Mari1 ; ITOH, Masamitsu1 ; WATANABE, Hidehiro1 ; FUNAKOSHI, Hideo2 ; OOISHI, Kotaro2 ; OKAMOTO, Yoshiki2 ; KANEDA, Masatoshi2
Process & Manufacturing Engineering Center, Semiconductor Company, Toshiba Corporation 1 Komukai Toshiba-cho, Saiwai-ku, Kawasaki-city, Japan
[1] Toshiba Corp, Japan
[2] Tokyo Electron Kyushu Ltd, Japan
[3] Dai Nippon Printing Co., Ltd, Japan - Conference title
- Photomask technology 2006 (19-22 September, 2006, Monterey, California, USA)
- Conference name
- Photomask technology (2006)
- Author (monograph)
- Martin, Patrick M (Editor); Naber, Robert J (Editor)
Society of photo-optical instrumentation engineers, United States (Organiser of meeting) - Source
Proceedings of SPIE, the International Society for Optical Engineering. 2006 ; 2Vol, pp 63494J.1-63494J.8 ; ref : 4 ref
- CODEN
- PSISDG
- ISSN
- 0277-786X
- ISBN
- 0-8194-6444-9
- Scientific domain
- Electronics; Optics; Physics
- Publisher
- SPIE, Bellingham, Washington
- Publication country
- United States
- Document type
- Conference Paper
- Language
- English
- Keyword (fr)
- Photolithographie Taille critique
- Keyword (en)
- Photolithography Critical size
- Keyword (es)
- Fotolitografía
- Classification
- Pascal
- 001 Exact sciences and technology / 001D Applied sciences / 001D03 Electronics / 001D03F Semiconductor electronics. Microelectronics. Optoelectronics. Solid state devices / 001D03F17 Microelectronic fabrication (materials and surfaces technology)
- Discipline
- Electronics
- Origin
- Inist-CNRS
- Database
- PASCAL
- INIST identifier
- 19104126
Sauf mention contraire ci-dessus, le contenu de cette notice bibliographique peut être utilisé dans le cadre d’une licence CC BY 4.0 Inist-CNRS / Unless otherwise stated above, the content of this bibliographic record may be used under a CC BY 4.0 licence by Inist-CNRS / A menos que se haya señalado antes, el contenido de este registro bibliográfico puede ser utilizado al amparo de una licencia CC BY 4.0 Inist-CNRS
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