No-forbidden-pitch SRAF rules for advanced contact lithography
- Author
- WANG, Ching-Heng1 ; QINGWEI LIU1 ; LIGUO ZHANG2 ; HUNG, Chi-Yuan3
[1] Semiconductor Manufacturing International Corp, China
[2] Mentor Graphics Corp, China
[3] Tsing-Hua University, Taiwan, Province of China - Conference title
- Photomask technology 2006 (19-22 September, 2006, Monterey, California, USA)
- Conference name
- Photomask technology (2006)
- Author (monograph)
- Martin, Patrick M (Editor); Naber, Robert J (Editor)
Society of photo-optical instrumentation engineers, United States (Organiser of meeting) - Source
Proceedings of SPIE, the International Society for Optical Engineering. 2006 ; 2Vol, pp 63494K.1-63494K.6 ; ref : 7 ref
- CODEN
- PSISDG
- ISSN
- 0277-786X
- ISBN
- 0-8194-6444-9
- Scientific domain
- Electronics; Optics; Physics
- Publisher
- SPIE, Bellingham, Washington
- Publication country
- United States
- Document type
- Conference Paper
- Language
- English
- Keyword (fr)
- Base donnée Eclairement Evaluation performance Fabrication microélectronique Lithographie Masque déphasage Ouverture numérique Procédé contact Qualité image Scanneur Tirage par contact Correction optique de proximité Illumination hors axe
- Keyword (en)
- Database Illumination Performance evaluation Microelectronic fabrication Lithography Phase shifting masks Numerical aperture Contact process Image quality Scanner Contact printing Optical proximity correction Off axis illumination
- Keyword (es)
- Base dato Alumbrado Evaluación prestación Fabricación microeléctrica Litografía Abertura numérica Procedimiento contacto Calidad imagen Escáner Tiraje por contacto Corrección de proximidad óptica Iluminación fuera de eje
- Classification
- Pascal
- 001 Exact sciences and technology / 001D Applied sciences / 001D03 Electronics / 001D03F Semiconductor electronics. Microelectronics. Optoelectronics. Solid state devices / 001D03F16 Imaging devices
- Pascal
- 001 Exact sciences and technology / 001D Applied sciences / 001D03 Electronics / 001D03F Semiconductor electronics. Microelectronics. Optoelectronics. Solid state devices / 001D03F17 Microelectronic fabrication (materials and surfaces technology)
- Discipline
- Electronics
- Origin
- Inist-CNRS
- Database
- PASCAL
- INIST identifier
- 19104127
Sauf mention contraire ci-dessus, le contenu de cette notice bibliographique peut être utilisé dans le cadre d’une licence CC BY 4.0 Inist-CNRS / Unless otherwise stated above, the content of this bibliographic record may be used under a CC BY 4.0 licence by Inist-CNRS / A menos que se haya señalado antes, el contenido de este registro bibliográfico puede ser utilizado al amparo de una licencia CC BY 4.0 Inist-CNRS
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